Inventor

PAWLOWSKI GEORG

DE71 patents

⚠️ This page may combine multiple inventors who share the name “PAWLOWSKI GEORG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PAWLOWSKI GEORG

HOECHST AG

Polyvinyl acetal with hydroxy aliphatic acetal groups useful in photosensitive negative working compositions

Heterocyclic compounds containing 4,6-bis-trichloromethyl-s-triazin-2-ly groups

Positive-working radiation sensitive mixture comprising sulfonic acid esters of 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine, and recording material containing these esters

Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture

Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer

2,3-bis(dialkylaminophenyl)quinoxalines and their use in electrophotographic recording materials

Photosensitive composition admixture of a diazonium salt polycondensation product and polymeric binder with carboxyl side chain groups

Oligomeric compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixture

Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound

Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound

Radiation-sensitive mixture containing novel polymers embodying units composed of amides of α, β-unsaturated carboxylic acids as binders

Negative-working radiation-sensitive mixtures, and radiation-sensitive recording material produced with these mixtures

Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom

Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use

Positive-acting radiation-sensitive mixture and recording material produced therewith

Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation

Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation

Photosensitive mixture and photosensitive recording material produced therefrom with polymeric binder which is reaction product of (thio) phosphinic acidiso (thio) cyanate and active hydrogen containing polymer

Optical component based on Langmuir-Blodgett layers

Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures

Radiation-sensitive mixture with a polymeric binder containing units of α,β-unsaturated carboxamides

Radiation-sensitive sulfonic acid esters and their use

Substituted 1-sulfonyloxy-2-pyridones and process for preparing them

Positive-working radiation-sensitive mixtures, and radiation-sensitive recording materials produced with these mixtures

Positively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixture

Polyfunctional α-diazo-β-keto esters and their use in light-sensitive compositions

Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation

HOECHST JAPAN

Positive-working radiation-sensitive mixture

Radiation sensitive composition

Radiation sensitive composition

Radiation-sensitive composition containing plasticizer

Positive-working radiation-sensitive mixture

Radiation-sensitive composition

Negative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resin

CLARIANT FINANCE BVI LTD

Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

Process for preparing resists

Composition for bottom reflection preventive film and novel polymeric dye for use in the same

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

Process for preparing resists

CLARIANT INT LTD

Radiation-sensitive composition of chemical amplification type

Antireflection or light-absorbing coating composition and polymer therefor

AZ ELECTRONIC MATERIALS USA

Process of imaging a photoresist with multiple antireflective coatings

Negative photoresist compositions

AGFA GEVAERT AG

Silicone-compatible photoinitiators, and photosensitive mixtures comprising them

CLARIANT AG

Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials