Inventor
HASEGAWA ISAHIRO
JP32 patents
⚠️ This page may combine multiple inventors who share the name “HASEGAWA ISAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS5290381AMar 1, 1994
Plasma etching apparatus
TOKYO ELECTRON LTD116 citations98
US5356515AOct 18, 1994
Dry etching method
TOKYO ELECTRON LTD139 citations97
US5698070ADec 16, 1997
Method of etching film formed on semiconductor wafer
TOKYO ELECTRON LTD56 citations96
US5539179AJul 23, 1996
Electrostatic chuck having a multilayer structure for attracting an object
TOKYO ELECTRON LTD96 citations96
US5270266ADec 14, 1993
Method of adjusting the temperature of a semiconductor wafer
TOKYO ELECTRON LTD75 citations96
US5255153AOct 19, 1993
Electrostatic chuck and plasma apparatus equipped therewith
TOKYO ELECTRON LTD78 citations96
US5221403AJun 22, 1993
Support table for plate-like body and processing apparatus using the table
TOKYO ELECTRON LTD60 citations96
US5660671AAug 26, 1997
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD49 citations95
US5223113AJun 29, 1993
Apparatus for forming reduced pressure and for processing object
TOKYO ELECTRON LTD74 citations95
US5203945AApr 20, 1993
Plasma processing apparatus having driving control section
TOKYO ELECTRON LTD24 citations93
US5302236AApr 12, 1994
Method of etching object to be processed including oxide or nitride portion
TOKYO ELECTRON LTD50 citations92
US5271788ADec 21, 1993
Plasma processing apparatus
TOKYO ELECTRON LTD38 citations92
US5376211ADec 27, 1994
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD14 citations81
US6261428B1Jul 17, 2001
Magnetron plasma process apparatus
TOKYO ELECTRON LTD10 citations74
US5195866AMar 23, 1993
Conveying apparatus
TOKYO ELECTRON LTD11 citations74
US5236556AAug 17, 1993
Plasma apparatus
TOKYO ELECTRON LTD9 citations73
US5387893AFeb 7, 1995
Permanent magnet magnetic circuit and magnetron plasma processing apparatus
TOKYO ELECTRON LTD16 citations72
US5474643ADec 12, 1995
Plasma processing apparatus
TOKYO ELECTRON LTD10 citations71
US5888338AMar 30, 1999
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD0 citations51
TOSHIBA KK
6 patentsUS5444207AAug 22, 1995
Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
TOSHIBA KK132 citations98
US5660744AAug 26, 1997
Plasma generating apparatus and surface processing apparatus
TOSHIBA KK65 citations96
US5310454AMay 10, 1994
Dry etching method
TOSHIBA KK54 citations96
US5161201ANov 3, 1992
Method of and apparatus for measuring pattern profile
TOSHIBA KK37 citations92
US5100508AMar 31, 1992
Method of forming fine patterns
TOSHIBA KK36 citations92
US5091050AFeb 25, 1992
Dry etching method
TOSHIBA KK11 citations74
CKD CORP
4 patentsUS11788777B2Oct 17, 2023
Temperature control system and integrated temperature control system
CKD CORP2 citations70
US11796247B2Oct 24, 2023
Temperature control system
CKD CORP0 citations49
US11703284B2Jul 18, 2023
Temperature control system and integrated temperature control system
CKD CORP0 citations49
US11656016B2May 23, 2023
Cooling system that comprises multiple cooling apparatus and reduces power consumption
CKD CORP0 citations49