Inventor
YAMAKOSHI YASUHIRO
JP26 patents
⚠️ This page may combine multiple inventors who share the name “YAMAKOSHI YASUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON MINING CO
5 patentsUS7347353B2Mar 25, 2008
Method for connecting magnetic substance target to backing plate, and magnetic substance target
NIPPON MINING CO20 citations88
US7618505B2Nov 17, 2009
Target of high-purity nickel or nickel alloy and its producing method
NIPPON MINING CO11 citations84
US7605481B2Oct 20, 2009
Nickel alloy sputtering target and nickel alloy thin film
NIPPON MINING CO15 citations84
US7740718B2Jun 22, 2010
Target of high-purity nickel or nickel alloy and its producing method
NIPPON MINING CO7 citations73
US7459036B2Dec 2, 2008
Hafnium alloy target and process for producing the same
NIPPON MINING CO5 citations73
JAPAN ENERGY CORP
4 patentsUS5460793AOct 24, 1995
Silicide targets for sputtering and method of manufacturing the same
JAPAN ENERGY CORP48 citations95
US6153315ANov 28, 2000
Sputtering target and method for manufacturing thereof
JAPAN ENERGY CORP44 citations92
US5618397AApr 8, 1997
Silicide targets for sputtering
JAPAN ENERGY CORP35 citations92
US5464520ANov 7, 1995
Silicide targets for sputtering and method of manufacturing the same
JAPAN ENERGY CORP36 citations90
YAMAKOSHI YASUHIRO
4 patentsUS8114341B2Feb 14, 2012
Nickel alloy sputtering target and nickel silicide film
YAMAKOSHI YASUHIRO4 citations60
US9677170B2Jun 13, 2017
Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same
YAMAKOSHI YASUHIRO1 citations50
US9249497B2Feb 2, 2016
Ni alloy sputtering target, Ni alloy thin film and Ni silicide film
YAMAKOSHI YASUHIRO0 citations48
US9653270B2May 16, 2017
Method for connecting magnetic substance target to backing plate, and magnetic substance target
YAMAKOSHI YASUHIRO0 citations45
OKABE TAKEO
3 patentsJX NIPPON MINING & METALS CORP
3 patentsUS10984992B2Apr 20, 2021
Sputtering target
JX NIPPON MINING & METALS CORP0 citations60
US10344373B2Jul 9, 2019
Process for producing a target formed of a sintering-resistant material of a high-melting point metal alloy, silicide, carbide, nitride or boride
JX NIPPON MINING & METALS CORP0 citations52
US7938918B2May 10, 2011
High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy
JX NIPPON MINING & METALS CORP0 citations52