Inventor

FAIRBAIRN KEVIN

US55 patents

⚠️ This page may combine multiple inventors who share the name “FAIRBAIRN KEVIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FAIRBAIRN KEVIN

APPLIED MATERIALS INC

High density plasma CVD reactor with combined inductive and capacitive coupling

Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions

Multideck wafer processing system

Apparatus and methods for upgraded substrate processing system with microwave plasma source

High density plasma CVD reactor with combined inductive and capacitive coupling

Remote plasma source

High density plasma CVD and etching reactor

Tandem process chamber

Method for depositing an amorphous carbon layer

Mixed frequency CVD process

Tandem process chamber

Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment

Gas delivery system

Ultra high throughput wafer vacuum processing system

CVD Processing chamber

Method of depositing an amorphous carbon layer

Mixed frequency CVD apparatus

Front end wafer staging with wafer cassette turntables and on-the-fly wafer center finding

Single loadlock chamber with wafer cooling function

Dual blade robot

Wafer tray and ceramic blade for semiconductor processing apparatus

Method of depositing an amorphous carbon layer

Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions

Apparatus and methods for upgraded substrate processing system with microwave plasma source

Apparatus and methods for upgraded substrate processing system with microwave plasma source

High density plasma CVD and etching reactor

Vertical dual loadlock chamber

CVD processing chamber

Load-lock with external staging area

Wafer tray and ceramic blade for semiconductor processing apparatus

Wafer tray and ceramic blade for semiconductor processing apparatus

Dome-shaped inductive coupling wall having a plurality of radii for an inductively coupled plasma reactor

Method of depositing an amorphous carbon layer

Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing

Process chamber exhaust system

Tandem process chamber

Wafer tray and ceramic blade for semiconductor processing apparatus

Microwave plasma generating apparatus with improved heat protection of sealing O-rings

ADVANCED ENERGY IND INC

Synchronized pulsing of plasma processing source and substrate bias

Synchronization between an excitation source and a substrate bias supply

Synchronization with a bias supply in a plasma processing system

Application of modulating supplies in a plasma processing system

Control of plasma processing systems that include plasma modulating supplies

Spatial and temporal control of ion bias voltage for plasma processing

Spatial monitoring and control of plasma processing environments

Spatial monitoring and control of plasma processing environments

Application of modulating supplies in a plasma processing system

Control of plasma sheath with bias supplies

Spatial control of plasma processing environments

Spatial monitoring and control of plasma processing environments