P

Inventor

MARSELLA JOHN ANTHONY

US18 patents
⚠️ This page may combine multiple inventors who share the name “MARSELLA JOHN ANTHONY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AIR PROD & CHEM

16 patents
US6281170B1Aug 28, 2001

Surface tension reduction with N,N,N'-trialkkyl ureas

AIR PROD & CHEM20 citations88
US5681907AOct 28, 1997

Fast cure amines for ambient and subambient cure of epoxy resins comprising methylamine adducts

AIR PROD & CHEM21 citations88
US6096891AAug 1, 2000

Process for the production of cyclic N,N'-dialkylureas

AIR PROD & CHEM17 citations84
US5972431AOct 26, 1999

Cyclic urea surfactants

AIR PROD & CHEM13 citations82
US7078358B2Jul 18, 2006

Low VOC cleanroom cleaning wipe

AIR PROD & CHEM10 citations73
US6179906B1Jan 30, 2001

Cyclic urea surfactants

AIR PROD & CHEM4 citations73
US6120978ASep 19, 2000

Use of N,N-dialkyl ureas in photoresist developers

AIR PROD & CHEM6 citations73
US5985968ANov 16, 1999

Surface tension reduction with N,N-dialkyl ureas

AIR PROD & CHEM15 citations73
US6605145B1Aug 12, 2003

Alkylformamide surfactants

AIR PROD & CHEM4 citations62
US6262156B1Jul 17, 2001

Cyclic urea surfactants

AIR PROD & CHEM2 citations62
US6238849B1May 29, 2001

Cyclic ureas in photoresist developers

AIR PROD & CHEM4 citations62
US7138550B2Nov 21, 2006

Bridged carbocyclic compounds and methods of making and using same

AIR PROD & CHEM4 citations61
US9062230B2Jun 23, 2015

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

AIR PROD & CHEM2 citations59
US10011741B2Jul 3, 2018

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

AIR PROD & CHEM0 citations49
US9305476B2Apr 5, 2016

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

AIR PROD & CHEM0 citations49
US8859428B2Oct 14, 2014

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

AIR PROD & CHEM0 citations48

VEDAGE GAMINI ANANDA

1 patent

WU AIPING

1 patent