P

Inventor

WU KUN-LIN

TW36 patents
⚠️ This page may combine multiple inventors who share the name “WU KUN-LIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

27 patents
US6120366ASep 19, 2000

Chemical-mechanical polishing pad

UNITED MICROELECTRONICS CORP99 citations97
US6077784AJun 20, 2000

Chemical-mechanical polishing method

UNITED MICROELECTRONICS CORP61 citations96
US6013581AJan 11, 2000

Method for preventing poisoned vias and trenches

UNITED MICROELECTRONICS CORP76 citations96
US5876508AMar 2, 1999

Method of cleaning slurry remnants after the completion of a chemical-mechanical polish process

UNITED MICROELECTRONICS CORP73 citations94
US6293850B1Sep 25, 2001

Chemical-mechanical polish machines and fabrication process using the same

UNITED MICROELECTRONICS CORP28 citations92
US6225204B1May 1, 2001

Method for preventing poisoned vias and trenches

UNITED MICROELECTRONICS CORP21 citations92
US6197650B1Mar 6, 2001

Method for forming capacitor

UNITED MICROELECTRONICS CORP24 citations92
US6183350B1Feb 6, 2001

Chemical-mechanical polish machines and fabrication process using the same

UNITED MICROELECTRONICS CORP28 citations92
US6071806AJun 6, 2000

Method for preventing poisoned vias and trenches

UNITED MICROELECTRONICS CORP46 citations92
US6180467B1Jan 30, 2001

Method of fabricating shallow trench isolation

UNITED MICROELECTRONICS CORP17 citations84
US6057248AMay 2, 2000

Method of removing residual contaminants in an alignment mark after a CMP process

UNITED MICROELECTRONICS CORP16 citations84
US6150259ANov 21, 2000

Method for forming a metal plug

UNITED MICROELECTRONICS CORP12 citations74
US6013559AJan 11, 2000

Method of forming trench isolation

UNITED MICROELECTRONICS CORP8 citations74
US6241582B1Jun 5, 2001

Chemical mechanical polish machines and fabrication process using the same

UNITED MICROELECTRONICS CORP6 citations73
US6119294ASep 19, 2000

Cleaning system with automatically controlled brush pressure

UNITED MICROELECTRONICS CORP8 citations73
US6062963AMay 16, 2000

Retainer ring design for polishing head of chemical-mechanical polishing machine

UNITED MICROELECTRONICS CORP10 citations73
US6030892AFeb 29, 2000

Method of preventing overpolishing in a chemical-mechanical polishing operation

UNITED MICROELECTRONICS CORP8 citations73
US6140232AOct 31, 2000

Method for reducing silicide resistance

UNITED MICROELECTRONICS CORP8 citations72
US6492240B1Dec 10, 2002

Method for forming improved high resistance resistor by treating the surface of polysilicon layer

UNITED MICROELECTRONICS CORP7 citations70
US5883004AMar 16, 1999

Method of planarization using interlayer dielectric

UNITED MICROELECTRONICS CORP8 citations69
US6333261B1Dec 25, 2001

Method for preventing aluminum intrusions

UNITED MICROELECTRONICS CORP13 citations68
US7335598B2Feb 26, 2008

Chemical-mechanical polishing method

UNITED MICROELECTRONICS CORP3 citations63
US6913993B2Jul 5, 2005

Chemical-mechanical polishing method

UNITED MICROELECTRONICS CORP2 citations63
US6190995B1Feb 20, 2001

Method of fabricating shallow trench isolation structure

UNITED MICROELECTRONICS CORP2 citations60
US6399503B1Jun 4, 2002

Method of preventing dishing phenomenon atop a dual damascene structure

UNITED MICROELECTRONICS CORP2 citations54
US7947603B2May 24, 2011

Chemical-mechanical polishing method

UNITED MICROELECTRONICS CORP0 citations52
US6234876B1May 22, 2001

Chemical-mechanical polish machines and fabrication process using the same

UNITED MICROELECTRONICS CORP0 citations51

PRIMAX ELECTRONICS LTD

3 patents

FOXCONN KUNSHAN COMPUTER CONNECTOR CO LTD

2 patents

FOXCONN INTERCONNECT TECHNOLOGY LTD

1 patent

MEDIATEK INC

1 patent

RAJOTTE JACQUES

1 patent

WU KUN-LIN

1 patent