Inventor
MURUGESH LAXMAN
US23 patents
⚠️ This page may combine multiple inventors who share the name “MURUGESH LAXMAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
22 patentsUS6217658B1Apr 17, 2001
Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD Processing
APPLIED MATERIALS INC886 citations98
US6136685AOct 24, 2000
High deposition rate recipe for low dielectric constant films
APPLIED MATERIALS INC343 citations98
US5937323AAug 10, 1999
Sequencing of the recipe steps for the optimal low-k HDP-CVD processing
APPLIED MATERIALS INC935 citations98
US6450117B1Sep 17, 2002
Directing a flow of gas in a substrate processing chamber
APPLIED MATERIALS INC572 citations96
US5994662ANov 30, 1999
Unique baffle to deflect remote plasma clean gases
APPLIED MATERIALS INC82 citations96
US6200911B1Mar 13, 2001
Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power
APPLIED MATERIALS INC57 citations95
US9993907B2Jun 12, 2018
Printed chemical mechanical polishing pad having printed window
APPLIED MATERIALS INC38 citations94
US5756222AMay 26, 1998
Corrosion-resistant aluminum article for semiconductor processing equipment
APPLIED MATERIALS INC49 citations94
US5811195ASep 22, 1998
Corrosion-resistant aluminum article for semiconductor processing equipment
APPLIED MATERIALS INC49 citations93
US7732056B2Jun 8, 2010
Corrosion-resistant aluminum component having multi-layer coating
APPLIED MATERIALS INC25 citations92
US6579811B2Jun 17, 2003
Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating
APPLIED MATERIALS INC19 citations92
US5811356ASep 22, 1998
Reduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaning
APPLIED MATERIALS INC48 citations92
US6375744B2Apr 23, 2002
Sequential in-situ heating and deposition of halogen-doped silicon oxide
APPLIED MATERIALS INC17 citations91
US6228781B1May 8, 2001
Sequential in-situ heating and deposition of halogen-doped silicon oxide
APPLIED MATERIALS INC25 citations91
US6159333ADec 12, 2000
Substrate processing system configurable for deposition or cleaning
APPLIED MATERIALS INC26 citations90
US5810937ASep 22, 1998
Using ceramic wafer to protect susceptor during cleaning of a processing chamber
APPLIED MATERIALS INC28 citations90
US5997685ADec 7, 1999
Corrosion-resistant apparatus
APPLIED MATERIALS INC41 citations87
US7431772B2Oct 7, 2008
Gas distributor having directed gas flow and cleaning method
APPLIED MATERIALS INC11 citations79
US9481608B2Nov 1, 2016
Surface annealing of components for substrate processing chambers
APPLIED MATERIALS INC4 citations72
US6878214B2Apr 12, 2005
Process endpoint detection in processing chambers
APPLIED MATERIALS INC9 citations66
US11007618B2May 18, 2021
Printing chemical mechanical polishing pad having window or controlled porosity
APPLIED MATERIALS INC1 citations53
US7135426B2Nov 14, 2006
Erosion resistant process chamber components
APPLIED MATERIALS INC5 citations53