Inventor

KOBAYASHI NORIHIRO

JP58 patents

⚠️ This page may combine multiple inventors who share the name “KOBAYASHI NORIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOBAYASHI NORIHIRO

SHINETSU HANDOTAI KK

Method for heat-treating silicon wafer and silicon wafer

Method of fabricating an SOI wafer by hydrogen ion delamination without independent bonding heat treatment

Method for producing silicon single crystal wafer and silicon single crystal wafer

Method for heat treatment of SOI wafer and SOI wafer heat-treated by the method

Method of producing silicon wafer and silicon wafer

Method for thermally annealing silicon wafer and silicon wafer

Method for producing silicon single crystal wafer and silicon single crystal wafer

Method for producing a silicon single crystal wafer and a silicon single crystal wafer

SOI wafers and methods for producing SOI wafer

Silicon wafer having plasma CVD gettering layer with components/composition changing in depth-wise direction and method of manufacturing the silicon wafer

Method for heat treatment of silicon wafer and silicon wafer

Silicon wafer, and method of manufacturing the same

Method for measuring rotation angle of bonded wafer

Method for heat treatment of silicon wafer and silicon wafer heat-treated by the method

Method for heat treatment of silicon wafers and silicon wafer

Heat treatment method for a silicon monocrystal wafer and a silicon monocrystal wafer

Heat treatment method for a silicon wafer and a silicon wafer heat-treated by the method

Heat treatment method for a silicon wafer and a silicon wafer heat-treated by the method

Method for manufacturing bonded SOI wafer

Method of producing annealed wafer and annealed wafer

Method of fabricating SOI wafer by ion implantation

Manufacturing process for annealed wafer and annealed wafer

Method of manufacturing mirror-polished silicon wafers, and apparatus for processing silicon wafers

Heat treatment jig for semiconductor wafers and a method for treating a surface of the same

Method for heat treatment of silicon wafers and silicon wafer

Method for manufacturing silicon wafer

Method of manufacturing SOI wafer and thus-manufactured SOI wafer

Annealed wafer manufacturing method and annealed wafer

Method for manufacturing single-crystal-silicon wafers

Method of producing annealed wafer and annealed wafer

Method for manufacturing a bonded SOI wafer and bonded SOI wafer

Method for manufacturing a bonded SOI wafer

Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace

Production method for annealed wafer

Process for manufacturing silicon epitaxial wafer

Silicon wafer

Method for producing silicon wafer and silicon wafer

Method for producing direct bonded wafer and direct bonded wafer

Method for manufacturing bonded SOI wafer

Method for producing SOI wafer

Method of producing bonded wafer with uniform thickness distribution

Method for manufacturing bonded wafer

FUJITSU LTD

Semiconductor device having a matrix array of contacts and a fabrication process thereof

Semiconductor device having a matrix array of contacts and a fabrication process thereof

KOBAYASHI NORIHIRO

Method for manufacturing bonded wafer

Method for manufacturing bonded wafer

HITACHI LTD

Monitoring system and monitoring method

KATO MASAHIRO

Silicon epitaxial wafer, method for manufacturing the same, bonded SOI wafer and method for manufacturing the same

SHIN ETSU HANDOTAI LTD

Silicon wafer including amorphous silicon layer formed by PCVD and method of manufacturing wafer

ISHIZUKA TOHRU

SOI wafer, semiconductor device, and method for manufacturing SOI wafer