Inventor
KARIM M ZIAUL
US28 patents
⚠️ This page may combine multiple inventors who share the name “KARIM M ZIAUL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
YIELD ENG SYSTEMS INC
12 patentsUS11465225B1Oct 11, 2022
Method of using processing oven
YIELD ENG SYSTEMS INC7 citations84
US12330228B2Jun 17, 2025
Method of using processing oven
YIELD ENG SYSTEMS INC1 citations73
US11456274B1Sep 27, 2022
Method of using a processing oven
YIELD ENG SYSTEMS INC6 citations73
US11850672B2Dec 26, 2023
Method of using processing oven
YIELD ENG SYSTEMS INC3 citations71
US11444053B2Sep 13, 2022
Batch processing oven and method
YIELD ENG SYSTEMS INC3 citations71
US11335662B2May 17, 2022
Solder reflow oven for batch processing
YIELD ENG SYSTEMS INC5 citations71
US12087623B1Sep 10, 2024
Dielectric liners on through glass vias
YIELD ENG SYSTEMS INC1 citations62
US12583043B2Mar 24, 2026
Process chamber with UV irradiance
YIELD ENG SYSTEMS INC0 citations59
US12330268B2Jun 17, 2025
Apparatus for coating removal
YIELD ENG SYSTEMS INC0 citations56
US12138745B2Nov 12, 2024
Apparatus and method for coating removal
YIELD ENG SYSTEMS INC0 citations56
US12374569B2Jul 29, 2025
Batch processing oven for magnetic anneal
YIELD ENG SYSTEMS INC0 citations52
US12042827B1Jul 23, 2024
Integrated ultrasonics and megasonics cleaning
YIELD ENG SYSTEMS INC0 citations38
APPLIED MATERIALS INC
8 patentsUS6903031B2Jun 7, 2005
In-situ-etch-assisted HDP deposition using SiF4 and hydrogen
APPLIED MATERIALS INC111 citations99
US6958112B2Oct 25, 2005
Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation
APPLIED MATERIALS INC77 citations98
US6808748B2Oct 26, 2004
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology
APPLIED MATERIALS INC269 citations98
US7205240B2Apr 17, 2007
HDP-CVD multistep gapfill process
APPLIED MATERIALS INC114 citations95
US7033945B2Apr 25, 2006
Gap filling with a composite layer
APPLIED MATERIALS INC43 citations92
US7294588B2Nov 13, 2007
In-situ-etch-assisted HDP deposition
APPLIED MATERIALS INC5 citations74
US7049211B2May 23, 2006
In-situ-etch-assisted HDP deposition using SiF4
APPLIED MATERIALS INC6 citations74
US7595088B2Sep 29, 2009
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology
APPLIED MATERIALS INC1 citations52
NOVELLUS SYSTEMS INC
4 patentsUS6303518B1Oct 16, 2001
Methods to improve chemical vapor deposited fluorosilicate glass (FSG) film adhesion to metal barrier or etch stop/diffusion barrier layers
NOVELLUS SYSTEMS INC123 citations96
US6417092B1Jul 9, 2002
Low dielectric constant etch stop films
NOVELLUS SYSTEMS INC97 citations95
US6844612B1Jan 18, 2005
Low dielectric constant fluorine-doped silica glass film for use in integrated circuit chips and method of forming the same
NOVELLUS SYSTEMS INC24 citations89
US7052988B1May 30, 2006
Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing
NOVELLUS SYSTEMS INC5 citations73