Inventor
TANIMOTO KENJI
JP67 patents
⚠️ This page may combine multiple inventors who share the name “TANIMOTO KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
16 patentsUS7683319B2Mar 23, 2010
Charge control apparatus and measurement apparatus equipped with the charge control apparatus
HITACHI HIGH TECH CORP36 citations92
US7728294B2Jun 1, 2010
Semiconductor wafer inspection tool and semiconductor wafer inspection method
HITACHI HIGH TECH CORP18 citations84
US7241996B2Jul 10, 2007
Charged particle beam apparatus
HITACHI HIGH TECH CORP8 citations74
US12068128B2Aug 20, 2024
Charged particle beam system
HITACHI HIGH TECH CORP2 citations73
US10903037B2Jan 26, 2021
Charged particle beam device
HITACHI HIGH TECH CORP2 citations72
US11353798B2Jun 7, 2022
Pattern measurement device and pattern measurement method
HITACHI HIGH TECH CORP2 citations71
US11251018B2Feb 15, 2022
Scanning electron microscope
HITACHI HIGH TECH CORP3 citations71
US10816332B2Oct 27, 2020
Pattern measurement device and pattern measurement method
HITACHI HIGH TECH CORP3 citations71
US7435960B2Oct 14, 2008
Charged particle beam apparatus
HITACHI HIGH TECH CORP2 citations63
US12586748B2Mar 24, 2026
Structure for particle acceleration and charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations62
US12469665B2Nov 11, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12394586B2Aug 19, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US10170273B2Jan 1, 2019
Charged particle beam device, and method of manufacturing component for charged particle beam device
HITACHI HIGH TECH CORP1 citations62
US9224575B2Dec 29, 2015
Charged particle beam device and overlay misalignment measurement method
HITACHI HIGH TECH CORP3 citations62
US12174551B2Dec 24, 2024
Pattern measurement device and pattern measurement method
HITACHI HIGH TECH CORP0 citations61
US11276554B2Mar 15, 2022
Scanning electron microscope and method for measuring pattern
HITACHI HIGH TECH CORP1 citations61
DAIKIN IND LTD
11 patentsUS6722156B2Apr 20, 2004
Refrigeration system
DAIKIN IND LTD38 citations92
US6119471ASep 19, 2000
Refrigerator for container
DAIKIN IND LTD22 citations91
US6698217B2Mar 2, 2004
Freezing device
DAIKIN IND LTD37 citations90
US6986259B2Jan 17, 2006
Refrigerator
DAIKIN IND LTD18 citations84
US6938430B2Sep 6, 2005
Refrigerating device
DAIKIN IND LTD12 citations84
US7237405B2Jul 3, 2007
Refrigeration apparatus
DAIKIN IND LTD15 citations82
US7155928B2Jan 2, 2007
Refrigerating apparatus
DAIKIN IND LTD7 citations74
US7028502B2Apr 18, 2006
Refrigeration equipment
DAIKIN IND LTD7 citations74
US7765817B2Aug 3, 2010
Refrigeration system
DAIKIN IND LTD3 citations62
US7752864B2Jul 13, 2010
Refrigeration apparatus
DAIKIN IND LTD4 citations62
US6883346B2Apr 26, 2005
Freezer
DAIKIN IND LTD5 citations62
NISSAN CHEMICAL IND LTD
10 patentsUS5221497AJun 22, 1993
Elongated-shaped silica sol and method for preparing the same
NISSAN CHEMICAL IND LTD239 citations96
US5196177AMar 23, 1993
Production of stable aqueous silica sol
NISSAN CHEMICAL IND LTD64 citations96
US5962343AOct 5, 1999
Process for producing crystalline ceric oxide particles and abrasive
NISSAN CHEMICAL IND LTD43 citations95
US5458864AOct 17, 1995
Process for producing high-purity silica by reacting crude silica with ammonium fluoride
NISSAN CHEMICAL IND LTD48 citations95
US7431758B2Oct 7, 2008
Cerium oxide particles and production method therefor
NISSAN CHEMICAL IND LTD34 citations92
US6706082B2Mar 16, 2004
Crystalline ceric oxide sol and process for producing the same
NISSAN CHEMICAL IND LTD26 citations92
US6372003B1Apr 16, 2002
Polishing abrasive of crystalline ceric oxide particles having surfaces modified with hydroxyl groups
NISSAN CHEMICAL IND LTD31 citations92
US5266289ANov 30, 1993
Process for producing high-purity silica by reacting crude silica with ammonium fluoride
NISSAN CHEMICAL IND LTD26 citations92
US6887289B2May 3, 2005
Cerium oxide sol and abrasive
NISSAN CHEMICAL IND LTD5 citations63
US7678703B2Mar 16, 2010
Production method of polishing composition
NISSAN CHEMICAL IND LTD2 citations62
SUMITOMO CHEMICAL CO
6 patentsUS4336109AJun 22, 1982
Method for the recovery of acetone
SUMITOMO CHEMICAL CO8 citations72
US3953521AApr 27, 1976
Process for the continuous production of dihydroperoxides
SUMITOMO CHEMICAL CO12 citations72
US3950431AApr 13, 1976
Process for removing impurities in an oxidation mixture
SUMITOMO CHEMICAL CO7 citations72
US3933921AJan 20, 1976
Process for the production of hydroperoxides
SUMITOMO CHEMICAL CO14 citations72
US4059637ANov 22, 1977
Method for extraction of dihydroperoxide
SUMITOMO CHEMICAL CO7 citations70
US3985819AOct 12, 1976
Process for producing alkylnaphthalenes
SUMITOMO CHEMICAL CO3 citations61
HITACHI LTD
3 patentsUS6583413B1Jun 24, 2003
Method of inspecting a circuit pattern and inspecting instrument
HITACHI LTD123 citations99
US7098455B2Aug 29, 2006
Method of inspecting a circuit pattern and inspecting instrument
HITACHI LTD26 citations93
US7397031B2Jul 8, 2008
Method of inspecting a circuit pattern and inspecting instrument
HITACHI LTD10 citations84
FUJI XEROX CO LTD
2 patentsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD
1 patentSUZUKI MAKOTO
1 patentShowing the top 50 of 67 patents by PatentIndex Score.