Inventor
TAKESHITA MASARU
JP42 patents
⚠️ This page may combine multiple inventors who share the name “TAKESHITA MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
20 patentsUS7482108B2Jan 27, 2009
Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
TOKYO OHKA KOGYO CO LTD92 citations97
US7968276B2Jun 28, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD11 citations84
US7592123B2Sep 22, 2009
Resin for photoresist composition, photoresist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations73
US7488568B2Feb 10, 2009
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD7 citations73
US8975010B2Mar 10, 2015
Method of forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations63
US7964331B2Jun 21, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations63
US7776511B2Aug 17, 2010
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations63
US7645559B2Jan 12, 2010
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US7494759B2Feb 24, 2009
Positive resist compositions and process for the formation of resist patterns with the same
TOKYO OHKA KOGYO CO LTD2 citations63
US12099298B2Sep 24, 2024
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations62
US7829259B2Nov 9, 2010
Resin for photoresist composition, photoresist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US7682770B2Mar 23, 2010
Resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US7491485B2Feb 17, 2009
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations61
US7767378B2Aug 3, 2010
Method for producing resist composition and resist composition
TOKYO OHKA KOGYO CO LTD0 citations52
US7638258B2Dec 29, 2009
Positive resist composition and method for resist pattern formation
TOKYO OHKA KOGYO CO LTD0 citations52
US7939243B2May 10, 2011
Resin, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
US7312015B2Dec 25, 2007
Process for refining crude resin for electronic material
TOKYO OHKA KOGYO CO LTD1 citations48
US7855044B2Dec 21, 2010
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations42
US7763412B2Jul 27, 2010
Polymer, positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations41
US7972762B2Jul 5, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations39
TAKESHITA MASARU
8 patentsUS8247161B2Aug 21, 2012
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
TAKESHITA MASARU6 citations83
US8486605B2Jul 16, 2013
Positive resist composition and method of forming resist pattern
TAKESHITA MASARU9 citations81
US8530598B2Sep 10, 2013
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
TAKESHITA MASARU4 citations61
US8338075B2Dec 25, 2012
Positive resist composition and method of forming resist pattern
TAKESHITA MASARU1 citations50
US9023577B2May 5, 2015
Resist composition and method of forming resist pattern
TAKESHITA MASARU1 citations49
US8535868B2Sep 17, 2013
Positive resist composition and method of forming resist pattern
TAKESHITA MASARU0 citations41
US8247159B2Aug 21, 2012
Positive resist composition and method of forming resist pattern
TAKESHITA MASARU0 citations41
US8216764B2Jul 10, 2012
Positive resist composition and method of forming resist pattern
TAKESHITA MASARU0 citations41