Inventor
BABICH KATHERINA
US20 patents
⚠️ This page may combine multiple inventors who share the name “BABICH KATHERINA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
14 patentsUS6730454B2May 4, 2004
Antireflective SiO-containing compositions for hardmask layer
IBM112 citations98
US6316167B1Nov 13, 2001
Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof
IBM189 citations98
US6514667B2Feb 4, 2003
Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof
IBM108 citations97
US6448655B1Sep 10, 2002
Stabilization of fluorine-containing low-k dielectrics in a metal/insulator wiring structure by ultraviolet irradiation
IBM50 citations95
US6759321B2Jul 6, 2004
Stabilization of fluorine-containing low-k dielectrics in a metal/insulator wiring structure by ultraviolet irradiation
IBM24 citations92
US7223517B2May 29, 2007
Lithographic antireflective hardmask compositions and uses thereof
IBM14 citations84
US7172849B2Feb 6, 2007
Antireflective hardmask and uses thereof
IBM10 citations83
US7648820B2Jan 19, 2010
Antireflective hardmask and uses thereof
IBM7 citations73
US7497959B2Mar 3, 2009
Methods and structures for protecting one area while processing another area on a chip
IBM7 citations73
US6730445B2May 4, 2004
Attenuated embedded phase shift photomask blanks
IBM8 citations72
US6682860B2Jan 27, 2004
Attenuated embedded phase shift photomask blanks
IBM7 citations72
US7651947B2Jan 26, 2010
Mask forming and implanting methods using implant stopping layer and mask so formed
IBM4 citations60
US6979518B2Dec 27, 2005
Attenuated embedded phase shift photomask blanks
IBM0 citations51
US7998871B2Aug 16, 2011
Mask forming and implanting methods using implant stopping layer
IBM0 citations50