Inventor
NOGA DAVID E
US2 patents
Patents
2 patentsUS9725617B2Aug 8, 2017
Low toxicity solvent system for polyamideimide and polyamide amic acid resin coating
FUJIFILM HUNT CHEMICALS U S A INC1 citations40
US9815941B2Nov 14, 2017
Low toxicity solvent system for polyamdieimide and polyamide amic acid resin manufacture
FUJIFILM HUNT CHEMICALS U S A INC0 citations36