Inventor

TAKEMOTO ICHIKI

JP39 patents

⚠️ This page may combine multiple inventors who share the name “TAKEMOTO ICHIKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAKEMOTO ICHIKI

SUMITOMO CHEMICAL CO

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

Resist composition

Resin suitable for an acid generator

Chemically amplified positive resist composition

Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

Herbicidal 2-substituted phenyl-4,5,6,7-tetrahydro-2H-indazoles

N&#39;-[4-(substituted phenethyloxy)phenyl]-N-methyl-N-methoxyurea

Process of producing fluoroaniline derivatives

2-substituted phenyl-4,5,6,7-tetrahydro-2H-indazoles, their production, and use as herbicides

Herbicidal compositions and methods employing urea derivatives

N&#39;-phenyl-N-methylurea derivatives

N-Phenyl-N-methyl-urea derivatives, and their production and use

N-(4-substituted benzyloxy)phenyl)-N-methyl-N-methoxyurea

Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same

N&#39;-Phenyl-N-methylurea derivatives

Urea derivatives, and their production and use

Imine derivatives and process for production thereof

Chemical amplification type positive resist composition

Process for producing tetrahydrophthalimides

N-[2-(Cyclopropyl) ethoxy] phenylanilide derivatives, and their production and use

Urea derivatives, and their production and use

Production of substituted phenylurea

Production of substituted phenylurea

Chemically amplified positive resist composition, a haloester derivative and a process for producing the same

Polyhydric phenol compound and chemically amplified resist composition containing the same

Chemically amplified positive resist composition

2-Substituted phenyl-4,5,6,7-tetrahydro-2H-indazoles

Urea derivatives, and their use as herbicides

Process for preparing optically active arylacetic acid derivative

Chemically amplified positive resist composition

TAKEMOTO ICHIKI

Imide compound and chemically amplified resist composition containing the same

Resin and chemically amplified resist composition comprising the same

Compound, method for preparing the compound and resist composition containing the compound

Compound and chemically amplified resist composition containing the same

Polyhydric compound and chemically amplified resist composition containing the same

FUJI YUSUKE

Chemically amplified positive resist composition

Chemically amplified positive resist composition

MASUYAMA TATSURO

Oxime compound and resist composition containing the same

N'-[4-(substituted phenethyloxy)phenyl]-N-methyl-N-methoxyurea

N'-phenyl-N-methylurea derivatives

N'-Phenyl-N-methylurea derivatives