Inventor
ARITA KIYOSHI
JP48 patents
⚠️ This page may combine multiple inventors who share the name “ARITA KIYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
19 patentsUS7060531B2Jun 13, 2006
Method of cutting semiconductor wafer and protective sheet used in the cutting method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD64 citations98
US6784112B2Aug 31, 2004
Method for surface treatment of silicon based substrate
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD81 citations98
US6313583B1Nov 6, 2001
Plasma processing apparatus and method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD103 citations95
US6969669B2Nov 29, 2005
Method of manufacturing semiconductor device and cutting apparatus for cutting semiconductor wafer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD44 citations93
US6897128B2May 24, 2005
Method of manufacturing semiconductor device, plasma processing apparatus and plasma processing method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD42 citations93
US6511917B2Jan 28, 2003
Plasma treatment apparatus and method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD28 citations93
US6239036B1May 29, 2001
Apparatus and method for plasma etching
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD35 citations93
US7056831B2Jun 6, 2006
Plasma processing apparatus and plasma processing method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations84
US5288008AFeb 22, 1994
Method of forming inner lead bonding on a microchip
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations82
US6867146B2Mar 15, 2005
Plasma processing method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations74
US6340639B1Jan 22, 2002
Plasma process apparatus and plasma process method for substrate
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations74
US5586713ADec 24, 1996
Method for wire bonding
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD17 citations74
US5207369AMay 4, 1993
Inner lead bonding apparatus
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6921720B2Jul 26, 2005
Plasma treating apparatus and plasma treating method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations71
US6418941B1Jul 16, 2002
Method of and apparatus for plasma cleaning of chip-mounted board
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations70
US7074720B2Jul 11, 2006
Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6852572B2Feb 8, 2005
Method of manufacturing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5 citations63
US6723651B2Apr 20, 2004
Plasma processing method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US5522263AJun 4, 1996
Apparatus and method for inspecting soldering condition of electronic component by using ultrasonic oscillation
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
PANASONIC CORP
16 patentsUS7906410B2Mar 15, 2011
Method of manufacturing semiconductor chip using laser light and plasma dicing
PANASONIC CORP192 citations99
US7767551B2Aug 3, 2010
Method for fabricating semiconductor chip
PANASONIC CORP183 citations99
US7678670B2Mar 16, 2010
TEG removing method in manufacturing method for semiconductor chips
PANASONIC CORP152 citations99
US7629228B2Dec 8, 2009
Manufacturing method for semiconductor devices, and formation apparatus for semiconductor wafer dicing masks
PANASONIC CORP155 citations99
US7927973B2Apr 19, 2011
Method for dividing semiconductor wafer and manufacturing method for semiconductor devices
PANASONIC CORP116 citations98
US7923351B2Apr 12, 2011
Manufacturing method of semiconductor devices
PANASONIC CORP121 citations98
US7767554B2Aug 3, 2010
Method of manufacturing semicondictor chip
PANASONIC CORP125 citations98
US8026181B2Sep 27, 2011
Manufacturing method for semiconductor chips
PANASONIC CORP31 citations93
US7994026B2Aug 9, 2011
Plasma dicing apparatus and method of manufacturing semiconductor chips
PANASONIC CORP31 citations92
US7488668B2Feb 10, 2009
Manufacturing method for semiconductor devices, arrangement determination method and apparatus for semiconductor device formation regions, and program for determining arrangement of semiconductor device formation regions
PANASONIC CORP40 citations92
US8383436B2Feb 26, 2013
Manufacturing method for semiconductor chips, and semiconductor chip
PANASONIC CORP9 citations84
US7708860B2May 4, 2010
Plasma processing apparatus
PANASONIC CORP17 citations84
US8012805B2Sep 6, 2011
Manufacturing method for semiconductor chips, and semiconductor chip
PANASONIC CORP5 citations63
US7964449B2Jun 21, 2011
Method for manufacturing semiconductor chip and method for processing semiconductor wafer
PANASONIC CORP3 citations63
US7871901B2Jan 18, 2011
Manufacturing method for semiconductor chips
PANASONIC CORP5 citations63
US7989803B2Aug 2, 2011
Manufacturing method for semiconductor chips and semiconductor wafer
PANASONIC CORP2 citations62
ARITA KIYOSHI
4 patentsUS8288284B2Oct 16, 2012
Substrate processing method, semiconductor chip manufacturing method, and resin-adhesive-layer-backed semiconductor chip manufacturing method
ARITA KIYOSHI4 citations61
US8757090B2Jun 24, 2014
Gas shower plate for plasma processing apparatus
ARITA KIYOSHI2 citations58
US8110481B2Feb 7, 2012
Method of segmenting semiconductor wafer
ARITA KIYOSHI0 citations51
US8293652B2Oct 23, 2012
Substrate processing method, semiconductor chip manufacturing method, and resin-adhesive-layer-backed semiconductor chip manufacturing method
ARITA KIYOSHI0 citations39
MIZUKAMI TATSUHIRO
3 patentsUS8668836B2Mar 11, 2014
Plasma processing device and method of monitoring plasma discharge state in plasma processing device
MIZUKAMI TATSUHIRO99 citations95
US8585862B2Nov 19, 2013
Plasma processing device and plasma discharge state monitoring device
MIZUKAMI TATSUHIRO4 citations60
US8956499B2Feb 17, 2015
Plasma processing device
MIZUKAMI TATSUHIRO0 citations39