P

Inventor

ARITA KIYOSHI

JP48 patents
⚠️ This page may combine multiple inventors who share the name “ARITA KIYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

19 patents
US7060531B2Jun 13, 2006

Method of cutting semiconductor wafer and protective sheet used in the cutting method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD64 citations98
US6784112B2Aug 31, 2004

Method for surface treatment of silicon based substrate

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD81 citations98
US6313583B1Nov 6, 2001

Plasma processing apparatus and method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD103 citations95
US6969669B2Nov 29, 2005

Method of manufacturing semiconductor device and cutting apparatus for cutting semiconductor wafer

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD44 citations93
US6897128B2May 24, 2005

Method of manufacturing semiconductor device, plasma processing apparatus and plasma processing method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD42 citations93
US6511917B2Jan 28, 2003

Plasma treatment apparatus and method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD28 citations93
US6239036B1May 29, 2001

Apparatus and method for plasma etching

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD35 citations93
US7056831B2Jun 6, 2006

Plasma processing apparatus and plasma processing method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations84
US5288008AFeb 22, 1994

Method of forming inner lead bonding on a microchip

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations82
US6867146B2Mar 15, 2005

Plasma processing method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations74
US6340639B1Jan 22, 2002

Plasma process apparatus and plasma process method for substrate

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations74
US5586713ADec 24, 1996

Method for wire bonding

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD17 citations74
US5207369AMay 4, 1993

Inner lead bonding apparatus

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6921720B2Jul 26, 2005

Plasma treating apparatus and plasma treating method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations71
US6418941B1Jul 16, 2002

Method of and apparatus for plasma cleaning of chip-mounted board

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations70
US7074720B2Jul 11, 2006

Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6852572B2Feb 8, 2005

Method of manufacturing semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5 citations63
US6723651B2Apr 20, 2004

Plasma processing method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US5522263AJun 4, 1996

Apparatus and method for inspecting soldering condition of electronic component by using ultrasonic oscillation

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52

PANASONIC CORP

16 patents
US7906410B2Mar 15, 2011

Method of manufacturing semiconductor chip using laser light and plasma dicing

PANASONIC CORP192 citations99
US7767551B2Aug 3, 2010

Method for fabricating semiconductor chip

PANASONIC CORP183 citations99
US7678670B2Mar 16, 2010

TEG removing method in manufacturing method for semiconductor chips

PANASONIC CORP152 citations99
US7629228B2Dec 8, 2009

Manufacturing method for semiconductor devices, and formation apparatus for semiconductor wafer dicing masks

PANASONIC CORP155 citations99
US7927973B2Apr 19, 2011

Method for dividing semiconductor wafer and manufacturing method for semiconductor devices

PANASONIC CORP116 citations98
US7923351B2Apr 12, 2011

Manufacturing method of semiconductor devices

PANASONIC CORP121 citations98
US7767554B2Aug 3, 2010

Method of manufacturing semicondictor chip

PANASONIC CORP125 citations98
US8026181B2Sep 27, 2011

Manufacturing method for semiconductor chips

PANASONIC CORP31 citations93
US7994026B2Aug 9, 2011

Plasma dicing apparatus and method of manufacturing semiconductor chips

PANASONIC CORP31 citations92
US7488668B2Feb 10, 2009

Manufacturing method for semiconductor devices, arrangement determination method and apparatus for semiconductor device formation regions, and program for determining arrangement of semiconductor device formation regions

PANASONIC CORP40 citations92
US8383436B2Feb 26, 2013

Manufacturing method for semiconductor chips, and semiconductor chip

PANASONIC CORP9 citations84
US7708860B2May 4, 2010

Plasma processing apparatus

PANASONIC CORP17 citations84
US8012805B2Sep 6, 2011

Manufacturing method for semiconductor chips, and semiconductor chip

PANASONIC CORP5 citations63
US7964449B2Jun 21, 2011

Method for manufacturing semiconductor chip and method for processing semiconductor wafer

PANASONIC CORP3 citations63
US7871901B2Jan 18, 2011

Manufacturing method for semiconductor chips

PANASONIC CORP5 citations63
US7989803B2Aug 2, 2011

Manufacturing method for semiconductor chips and semiconductor wafer

PANASONIC CORP2 citations62

ARITA KIYOSHI

4 patents

MIZUKAMI TATSUHIRO

3 patents

NONOMURA MASARU

2 patents

PANASONIC IP MAN CO LTD

1 patent

DISCO CORP

1 patent

HAJI HIROSHI

1 patent

KROSAKI HARIMA CORP

1 patent