Inventor
KOMINATO ATSUSHI
JP34 patents
⚠️ This page may combine multiple inventors who share the name “KOMINATO ATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
17 patentsUS8029948B2Oct 4, 2011
Photomask blank, photomask, and methods of manufacturing the same
HOYA CORP7 citations84
US9195133B2Nov 24, 2015
Mask blank, transfer mask and method of manufacturing transfer mask
HOYA CORP1 citations63
US8043771B2Oct 25, 2011
Phase shift mask blank and method of manufacturing phase shift mask
HOYA CORP6 citations63
US7655364B2Feb 2, 2010
Methods of manufacturing mask blank and transfer mask
HOYA CORP3 citations63
US11016382B2May 25, 2021
Mask blanks, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US11327396B2May 10, 2022
Mask blank
HOYA CORP0 citations52
US10551733B2Feb 4, 2020
Mask blanks, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations52
US9651859B2May 16, 2017
Mask blank, transfer mask and method of manufacturing transfer mask
HOYA CORP0 citations52
US9612527B2Apr 4, 2017
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
HOYA CORP0 citations52
US9372393B2Jun 21, 2016
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
HOYA CORP1 citations52
US9256122B2Feb 9, 2016
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
HOYA CORP0 citations52
US9075320B2Jul 7, 2015
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
HOYA CORP0 citations52
US9075314B2Jul 7, 2015
Photomask blank, photomask, and method for manufacturing photomask blank
HOYA CORP0 citations52
US9005851B2Apr 14, 2015
Phase shift mask blank and phase shift mask
HOYA CORP1 citations52
US7794901B2Sep 14, 2010
Method of manufacturing mask blank and transfer mask
HOYA CORP0 citations52
US9625807B2Apr 18, 2017
Mask blank, transfer mask, method of manufacturing a mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor device
HOYA CORP0 citations47
US9664997B2May 30, 2017
Method of manufacturing mask blank and method of manufacturing transfer mask
HOYA CORP0 citations42
IWASHITA HIROYUKI
7 patentsUS8507155B2Aug 13, 2013
Photomask blank, photomask, and method for manufacturing photomask blank
IWASHITA HIROYUKI3 citations62
US8329364B2Dec 11, 2012
Phase shift mask blank and phase shift mask
IWASHITA HIROYUKI5 citations62
US8304147B2Nov 6, 2012
Photomask blank, photomask, and method for manufacturing photomask blank
IWASHITA HIROYUKI1 citations62
US8865378B2Oct 21, 2014
Photomask blank, photomask, and methods of manufacturing the same
IWASHITA HIROYUKI0 citations51
US8512916B2Aug 20, 2013
Photomask blank, photomask, and method for manufacturing photomask blank
IWASHITA HIROYUKI0 citations51
US8431290B2Apr 30, 2013
Photomask blank, photomask, and methods of manufacturing the same
IWASHITA HIROYUKI0 citations51
US8404406B2Mar 26, 2013
Photomask blank and method for manufacturing the same
IWASHITA HIROYUKI0 citations51
HASHIMOTO MASAHIRO
3 patentsUS8637213B2Jan 28, 2014
Mask blank and transfer mask
HASHIMOTO MASAHIRO5 citations84
US8940462B2Jan 27, 2015
Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor device
HASHIMOTO MASAHIRO7 citations83
US8323858B2Dec 4, 2012
Photomask blank, photomask, and methods of manufacturing the same
HASHIMOTO MASAHIRO0 citations52
KOMINATO ATSUSHI
3 patentsUS8822103B2Sep 2, 2014
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
KOMINATO ATSUSHI2 citations61
US8574793B2Nov 5, 2013
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
KOMINATO ATSUSHI2 citations61
US8501372B2Aug 6, 2013
Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
KOMINATO ATSUSHI1 citations61
YAMADA TAKEYUKI
2 patentsUS8697315B2Apr 15, 2014
Photomask blank and production method thereof, and photomask production method, and semiconductor device production method
YAMADA TAKEYUKI0 citations50
US8114556B2Feb 14, 2012
Photomask blank and production method thereof, and photomask production method, and semiconductor device production method
YAMADA TAKEYUKI1 citations50