Inventor

TERASAWA TSUNEO

JP69 patents

⚠️ This page may combine multiple inventors who share the name “TERASAWA TSUNEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TERASAWA TSUNEO

HITACHI LTD

Chamber plate for use in cell fusion and a process for production thereof

Semiconductor device and a manufacturing method of the same

X-ray pattern masking by a reflective reduction projection optical system

Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens

Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system

Method of forming a pattern

Method of and apparatus for detecting defect on photomask

Spectrometer

Angular velocity and acceleration sensor

Pattern detecting apparatus

Method of magnetically recording and reading data, magnetic recording medium, its production method and magnetic recording apparatus

Methods for measuring optical system, and method and apparatus for exposure using said measuring method

Projection exposure apparatus and pattern forming method for use therewith

Illumination method, illumination apparatus and projection exposure apparatus

Method and apparatus for circuit pattern inspection

Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices

Method of forming a pattern and projection exposure apparatus

Projection exposure apparatus

Pattern printing method and apparatus

Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system

Pattern forming method and projection exposure tool therefor

Workpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the same

Projection type X-ray lithography apparatus

Pattern detector

Pattern generator

Method of forming patterns and apparatus for carrying out the same

Method and apparatus for circuit pattern inspection

Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate

Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM

Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices

Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices

Monochromator

Automatic focusing apparatus

Method of position detection and the method and apparatus of printing patterns by use of the position detection method

RENESAS TECH CORP

Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same

Method of manufacturing a photomask

Method of manufacturing a photomask

Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light

Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light

Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks

SHINETSU CHEMICAL CO

Substrate defect inspection method and substrate defect inspection apparatus

Defect classification method, method of sorting photomask blanks, and method of manufacturing mask blank

Photomask blank and making method

Methods for defect inspection, sorting, and manufacturing photomask blank

Defect inspecting method, sorting method, and producing method for photomask blank

Evaluation method of defect size of photomask blank, selection method, and manufacturing method

TERASAWA TSUNEO

Method of inspecting mask pattern and mask pattern inspection apparatus

HITACJI LTD

Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor

RENESAS ELECTRONICS CORP

Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits

TOSHIBA KK

Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device