Inventor

SUGA OSAMU

JP9 patents

⚠️ This page may combine multiple inventors who share the name “SUGA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

2 patents

US5424173AJun 13, 1995

Electron beam lithography system and method

HITACHI LTD49 citations96

US5097138AMar 17, 1992

Electron beam lithography system and method

HITACHI LTD52 citations96

TERASAWA TSUNEO

2 patents

US8488866B2Jul 16, 2013

Method of inspecting mask pattern and mask pattern inspection apparatus

TERASAWA TSUNEO12 citations81

US9063098B2Jun 23, 2015

Method of inspecting mask, mask inspection device, and method of manufacturing mask

TERASAWA TSUNEO0 citations50

RENESAS ELECTRONICS CORP

2 patents

US7844934B2Nov 30, 2010

Method for designing a semiconductor integrated circuit layout capable of reducing the processing time for optical proximity effect correction

RENESAS ELECTRONICS CORP7 citations70

US9229314B2Jan 5, 2016

Method of inspecting mask, mask inspection device, and method of manufacturing mask

RENESAS ELECTRONICS CORP1 citations51

ORIGINAL ENGINEERING CONSULTAN

1 patent

US6873942B1Mar 29, 2005

3-D structure design system, a method for designing 3-D structure and a recording medium readable by a computer having a program allowing the computer to execute the method recorded therein

ORIGINAL ENGINEERING CONSULTAN21 citations87

TOSHIBA KK

1 patent

US7960076B2Jun 14, 2011

Reflective-type mask

TOSHIBA KK5 citations62

KAMO TAKASHI

1 patent

US8173332B2May 8, 2012

Reflection-type exposure mask and method of manufacturing a semiconductor device

KAMO TAKASHI5 citations60