P

Inventor

TANAKA TOSHIHIKO

JP182 patents
⚠️ This page may combine multiple inventors who share the name “TANAKA TOSHIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

21 patents
US5733712AMar 31, 1998

Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed

HITACHI LTD62 citations96
US5362591ANov 8, 1994

Mask having a phase shifter and method of manufacturing same

HITACHI LTD42 citations96
US5235400AAug 10, 1993

Method of and apparatus for detecting defect on photomask

HITACHI LTD77 citations96
US5196910AMar 23, 1993

Semiconductor memory device with recessed array region

HITACHI LTD108 citations96
US4992825AFeb 12, 1991

Method of forming pattern and projection aligner for carrying out the same

HITACHI LTD39 citations96
US4937619AJun 26, 1990

Projection aligner and exposure method

HITACHI LTD92 citations96
US4904569AFeb 27, 1990

Method of forming pattern and projection aligner for carrying out the same

HITACHI LTD64 citations96
US4882289ANov 21, 1989

Method of making a semiconductor memory device with recessed array region

HITACHI LTD85 citations96
US4869999ASep 26, 1989

Method of forming pattern and projection aligner for carrying out the same

HITACHI LTD81 citations96
US6656644B2Dec 2, 2003

Manufacturing method of photomask and photomask

HITACHI LTD64 citations95
US6495870B1Dec 17, 2002

Semiconductor device and method for patterning the semiconductor device in which line patterns terminate at different lengths to prevent the occurrence of a short or break

HITACHI LTD25 citations93
US5885735AMar 23, 1999

Mask having a phase shifter and method of manufacturing same

HITACHI LTD20 citations93
US4575399AMar 11, 1986

Method of pattern detection

HITACHI LTD40 citations93
US4563241AJan 7, 1986

Method of forming patterns

HITACHI LTD26 citations93
US6653052B2Nov 25, 2003

Electron device manufacturing method, a pattern forming method, and a photomask used for those methods

HITACHI LTD15 citations92
US5296729AMar 22, 1994

Semiconductor memory device having static random access memory

HITACHI LTD48 citations92
US6703171B2Mar 9, 2004

Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method

HITACHI LTD13 citations84
US6645856B2Nov 11, 2003

Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate

HITACHI LTD16 citations84
USRE38296ENov 4, 2003

Semiconductor memory device with recessed array region

HITACHI LTD17 citations84
US6617265B2Sep 9, 2003

Photomask and method for manufacturing the same

HITACHI LTD16 citations84
US6558855B2May 6, 2003

Phase shift mask and manufacturing the same

HITACHI LTD13 citations84

RENESAS TECH CORP

5 patents

MITSUBISHI ELECTRIC CORP

3 patents

OLYMPUS OPTICAL CO

3 patents

HITACHI METALS LTD

3 patents

MITSUBISHI CHEM CORP

2 patents

NTN TOYO BEARING CO LTD

2 patents

SORTEC CORP

2 patents

HITICHI LTD

1 patent

TAKATA CORP

1 patent

SANYO ELECTRIC CO

1 patent

KAYAMA RYOZO

1 patent

JAPAN DISPLAY INC

1 patent

DENSO CORP

1 patent

OLYMPUS CORP

1 patent

TOYOTA MOTOR CO LTD

1 patent

SUMITOMO HEAVY INDUSTRIES

1 patent

Showing the top 50 of 182 patents by PatentIndex Score.