Inventor

HASEGAWA NORIO

JP118 patents

⚠️ This page may combine multiple inventors who share the name “HASEGAWA NORIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HASEGAWA NORIO

HITACHI LTD

Semiconductor integrated circuit and method of fabricating the same

Semiconductor device having a shielding conductor

Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens

Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system

Photomask and pattern forming method employing the same

Mask having a phase shifter and method of manufacturing same

Method of and apparatus for detecting defect on photomask

Semiconductor memory device with recessed array region

Method of forming pattern and projection aligner for carrying out the same

Projection aligner and exposure method

Method of forming pattern and projection aligner for carrying out the same

Method of making a semiconductor memory device with recessed array region

Method of forming pattern and projection aligner for carrying out the same

Manufacturing method of photomask and photomask

Method for producing a semiconductor device

Manufacturing method of semiconductor integrated circuit device

Manufacturing method of semiconductor integrated circuit device having a capacitor

Mask having a phase shifter and method of manufacturing same

Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices

Photomask and method for manufacturing semiconductor device using photomask

Method of pattern detection

Method of forming patterns

Semiconductor integrated circuit device and manufacturing method thereof

Electron device manufacturing method, a pattern forming method, and a photomask used for those methods

Semiconductor integrated circuit device and manufacturing method thereof

Semiconductor integrated circuit device and process for manufacturing the same

Method for manufacturing semiconductor devices utilizing plurality of exposure systems

Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system

Pattern forming method

Semiconductor memory device having static random access memory

Method of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by lithography

Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods

Air fuel ratio detecting arrangement and method therefor for an internal combustion engine

Manufacturing method of semiconductor integrated circuit device

Fabrication method of semiconductor integrated circuit device

Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate

Semiconductor memory device with recessed array region

Photomask and method for manufacturing the same

Phase shift mask and manufacturing the same

Mask having a phase shifter and method of manufacturing same

RENESAS TECH CORP

Method of manufacturing semiconductor integrated circuit devices

Fabrication method of semiconductor integrated circuit device

Manufacturing method of semiconductor integrated circuit device

Fabrication method of semiconductor integrated circuit device and mask

SONY CORP

Disc players fitted for automatic change of discs

Plural disk cartridge arrangement

HITICHI LTD

Method of forming a pattern

DAINIPPON PRINTING CO LTD

Fabrication method of semiconductor integrated circuit device and mask fabrication method

HOTTA SHOJI

Method and apparatus for pattern position and overlay measurement

HITACHI INT ELECTRIC INC

Transmitter for suppressing a variation in input level of a multicarrier signal