Inventor
AKAE NAONORI
JP40 patents
⚠️ This page may combine multiple inventors who share the name “AKAE NAONORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
25 patentsUSD739832SSep 29, 2015
Reaction tube
HITACHI INT ELECTRIC INC34 citations94
USD725055SMar 24, 2015
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HITACHI INT ELECTRIC INC36 citations94
USD719114SDec 9, 2014
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HITACHI INT ELECTRIC INC19 citations92
USD711843SAug 26, 2014
Reaction tube
HITACHI INT ELECTRIC INC30 citations92
USD773609SDec 6, 2016
Return nozzle
HITACHI INT ELECTRIC INC10 citations84
USD771772SNov 15, 2016
Return nozzle
HITACHI INT ELECTRIC INC8 citations84
US8925562B1Jan 6, 2015
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC6 citations84
USD720707SJan 6, 2015
Reaction tube
HITACHI INT ELECTRIC INC14 citations84
US8809204B2Aug 19, 2014
Method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC4 citations84
US11462401B2Oct 4, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations73
US9685317B2Jun 20, 2017
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC2 citations73
US9508546B2Nov 29, 2016
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US9425075B2Aug 23, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC3 citations73
US9401272B2Jul 26, 2016
Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC3 citations73
US8895455B2Nov 25, 2014
Method for manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC5 citations73
US10513775B2Dec 24, 2019
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC4 citations72
US10081868B2Sep 25, 2018
Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC6 citations72
US9966251B2May 8, 2018
Method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations72
US9966252B2May 8, 2018
Method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations72
USD771543SNov 15, 2016
Return nozzle
HITACHI INT ELECTRIC INC2 citations63
US9269566B2Feb 23, 2016
Substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations63
US9011601B2Apr 21, 2015
Substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations63
US10513774B2Dec 24, 2019
Substrate processing apparatus and guide portion
HITACHI INT ELECTRIC INC1 citations62
US9905413B2Feb 27, 2018
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations51
US9601326B2Mar 21, 2017
Method of manufacturing semiconductor device, including film having uniform thickness
HITACHI INT ELECTRIC INC1 citations46
AKAE NAONORI
6 patentsUS8415258B2Apr 9, 2013
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
AKAE NAONORI480 citations98
US8076251B2Dec 13, 2011
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
AKAE NAONORI489 citations98
US8609551B2Dec 17, 2013
Method for manufacturing semiconductor device and substrate processing apparatus
AKAE NAONORI6 citations84
US8895457B2Nov 25, 2014
Method of manufacturing semiconductor device and substrate processing apparatus
AKAE NAONORI7 citations83
US8673790B2Mar 18, 2014
Method of manufacturing a semiconductor device, method of cleaning a process vessel, and substrate processing apparatus
AKAE NAONORI5 citations72
US8524580B2Sep 3, 2013
Manufacturing method of semiconductor substrate and substrate processing apparatus
AKAE NAONORI2 citations62
SASAJIMA RYOTA
3 patentsUS8252701B2Aug 28, 2012
Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
SASAJIMA RYOTA16 citations90
US9039838B2May 26, 2015
Method of manufacturing semiconductor device and substrate processing apparatus
SASAJIMA RYOTA2 citations60
US9096928B2Aug 4, 2015
Method of manufacturing semiconductor device and substrate processing apparatus
SASAJIMA RYOTA0 citations40
OTA YOSUKE
3 patentsUS8202809B2Jun 19, 2012
Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
OTA YOSUKE6 citations72
US8901014B2Dec 2, 2014
Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and non-transitory computer readable recording medium
OTA YOSUKE3 citations62
US9196473B2Nov 24, 2015
Method of manufacturing an oxynitride film for a semiconductor device
OTA YOSUKE0 citations41