Inventor
JAFARIAN-TEHRANI SEYED JAFAR
US26 patents
⚠️ This page may combine multiple inventors who share the name “JAFARIAN-TEHRANI SEYED JAFAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
18 patentsUS9720022B2Aug 1, 2017
Systems and methods for providing characteristics of an impedance matching model for use with matching networks
LAM RES CORP21 citations94
US9620334B2Apr 11, 2017
Control of etch rate using modeling, feedback and impedance match
LAM RES CORP20 citations93
US5812361ASep 22, 1998
Dynamic feedback electrostatic wafer chuck
LAM RES CORP97 citations93
US7435926B2Oct 14, 2008
Methods and array for creating a mathematical model of a plasma processing system
LAM RES CORP42 citations92
US6873114B2Mar 29, 2005
Method for toolmatching and troubleshooting a plasma processing system
LAM RES CORP45 citations92
US6563076B1May 13, 2003
Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor
LAM RES CORP30 citations92
US6509542B1Jan 21, 2003
Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor
LAM RES CORP28 citations92
US5824606AOct 20, 1998
Methods and apparatuses for controlling phase difference in plasma processing systems
LAM RES CORP75 citations92
US6919689B2Jul 19, 2005
Method for toolmatching and troubleshooting a plasma processing system
LAM RES CORP16 citations84
US10381201B2Aug 13, 2019
Control of etch rate using modeling, feedback and impedance match
LAM RES CORP5 citations73
US11837446B2Dec 5, 2023
High power cable for heated components in RF environment
LAM RES CORP2 citations66
US9312832B2Apr 12, 2016
High power filter with single adjust for multiple channels
LAM RES CORP2 citations63
US7983018B2Jul 19, 2011
Plasma processing system ESC high voltage control and methods thereof
LAM RES CORP2 citations60
US7768766B2Aug 3, 2010
Plasma processing system ESC high voltage control
LAM RES CORP4 citations60
US12217944B2Feb 4, 2025
High power cable for heated components in RF environment
LAM RES CORP0 citations56
US10690727B2Jun 23, 2020
Identifying components associated with a fault in a plasma system
LAM RES CORP0 citations52
US9851389B2Dec 26, 2017
Identifying components associated with a fault in a plasma system
LAM RES CORP0 citations52
US10812033B2Oct 20, 2020
High-power radio-frequency spiral-coil filter
LAM RES CORP0 citations36
LONG MAOLIN
3 patentsUS8736175B2May 27, 2014
Current control in plasma processing systems
LONG MAOLIN4 citations72
US9305750B2Apr 5, 2016
Adjusting current ratios in inductively coupled plasma processing systems
LONG MAOLIN2 citations62
US8742666B2Jun 3, 2014
Radio frequency (RF) power filters and plasma processing systems including RF power filters
LONG MAOLIN0 citations33