Inventor

HIRUKAWA SHIGERU

JP68 patents

⚠️ This page may combine multiple inventors who share the name “HIRUKAWA SHIGERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HIRUKAWA SHIGERU

NIKON CORP

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method

Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision

Exposure method, exposure apparatus, and method for producing device

Photo-mask and method of exposing and projection-exposing apparatus

Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns

Distortion inspecting method for projection optical system

Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium

Alignment method

Projection-exposing apparatus with deflecting grating member

Projection exposure apparatus

Exposure method and apparatus, and method for fabricating device

Imaging characteristic and asymetric abrerration measurement of projection optical system

Exposure apparatus and device manufacturing method

Projection exposure apparatus and method employing rectilinear aperture stops for use with periodic mask patterns

Photo mask and exposure method using the same

Projection exposure apparatus

EGA alignment method using a plurality of weighting coefficients

Exposure apparatus and device manufacturing method

Exposure apparatus and method for producing device

Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method

Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method

Method for aligning processing areas on a substrate with a predetermined position in a static coordinate system

Exposure condition measurement method

Method of measuring the best focus position having a plurality of measuring mark images and a plurality of focus positions

Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method

Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium

Exposure apparatus, exposure method, method for producing device, and optical part

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Photo mask and exposure method using same

Exposure method and device producing method using the same

Method of measuring a leveling plane

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus and method for producing device

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

HIRUKAWA SHIGERU

Exposure method, exposure apparatus, and method for producing device

Exposure method, exposure apparatus, and method for producing device

Exposure method, exposure apparatus, and method for producing device

Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method

KUDO TAKEHITO

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas

KOBAYASHI NAOYUKI

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus, exposure method, and method for producing device

NIKON CORPORATON

Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions

NIKON PRECISION INC

Method and apparatus for determining performance characteristics in lithographic tools

NAGASAKA HIROYUKI

Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device