Inventor
MATSUNAGA KENTARO
JP30 patents
⚠️ This page may combine multiple inventors who share the name “MATSUNAGA KENTARO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
17 patentsUS7423728B2Sep 9, 2008
Immersion exposure method and apparatus, and manufacturing method of a semiconductor device
TOSHIBA KK15 citations84
US6225033B1May 1, 2001
Method of forming a resist pattern
TOSHIBA KK9 citations74
US6045981AApr 4, 2000
Method of manufacturing semiconductor device
TOSHIBA KK9 citations73
US9306221B2Apr 5, 2016
Fuel electrodes for solid oxide electrochemical cell, processes for producing the same, and solid oxide electrochemical cells
TOSHIBA KK4 citations71
US7742150B2Jun 22, 2010
Manufacturing method of semiconductor device
TOSHIBA KK4 citations63
US9153456B2Oct 6, 2015
Pattern forming method using block copolymers
TOSHIBA KK2 citations61
US9465295B2Oct 11, 2016
Pattern forming method
TOSHIBA KK2 citations60
US9260300B2Feb 16, 2016
Pattern formation method and pattern formation apparatus
TOSHIBA KK1 citations52
US7973907B2Jul 5, 2011
Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate
TOSHIBA KK0 citations52
US7794923B2Sep 14, 2010
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
TOSHIBA KK1 citations52
US9209052B2Dec 8, 2015
Semiconductor manufacturing apparatus and device manufacturing method using substrate distortion correction
TOSHIBA KK1 citations51
US9034766B2May 19, 2015
Pattern formation method
TOSHIBA KK1 citations51
US8999600B2Apr 7, 2015
Solid oxide electrochemical cell
TOSHIBA KK0 citations51
US9349585B2May 24, 2016
Pattern formation method
TOSHIBA KK1 citations45
US7794922B2Sep 14, 2010
Pattern forming method and method of manufacturing semiconductor device
TOSHIBA KK0 citations42
US9335642B2May 10, 2016
EUV exposure apparatus and cleaning method
TOSHIBA KK0 citations41
US9070559B2Jun 30, 2015
Pattern forming method and method of manufacturing semiconductor device
TOSHIBA KK0 citations35
MATSUNAGA KENTARO
3 patentsUS8747682B2Jun 10, 2014
Pattern formation method and method for manufacturing semiconductor device
MATSUNAGA KENTARO4 citations70
US8158332B2Apr 17, 2012
Method of manufacturing a semiconductor device
MATSUNAGA KENTARO4 citations59
US8138059B2Mar 20, 2012
Semiconductor device manufacturing method
MATSUNAGA KENTARO0 citations48
TOSHIBA MEMORY CORP
3 patentsUS10903225B2Jan 26, 2021
Storage device and manufacturing method for the same
TOSHIBA MEMORY CORP1 citations53
US10068915B2Sep 4, 2018
Manufacturing method for a semiconductor device including resist films different in thickness
TOSHIBA MEMORY CORP0 citations51
US10054856B2Aug 21, 2018
Exposure method, manufacturing method of device, and thin film sheet
TOSHIBA MEMORY CORP0 citations51