Inventor

GOLDFARB DARIO L

US53 patents

⚠️ This page may combine multiple inventors who share the name “GOLDFARB DARIO L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GOLDFARB DARIO L

IBM

Liquid or supercritical carbon dioxide composition

Process of drying a cast polymeric film disposed on a workpiece

Process of cleaning semiconductor processing, handling and manufacturing equipment

Process of drying semiconductor wafers using liquid or supercritical carbon dioxide

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

Forming an electrode having reduced corrosion and water decomposition on surface using an organic protective layer

Method for fabricating dual damascene structures

Method for fabricating dual damascene structures

Graded spin-on organic antireflective coating for photolithography

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

Polymer brushes for extreme ultraviolet photolithography

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

Plasma shallow doping and wet removal of depth control cap

Mechanical isolation control for an extreme ultraviolet (EUV) pellicle

Mechanical isolation control for an extreme ultraviolet (EUV) pellicle

Extreme ultraviolet (EUV) radiation pellicle formation method

Apparatus and method for reducing contamination in immersion lithography

Method to reduce photoresist pattern collapse by controlled surface microroughening

Resist performance for the negative tone develop organic development process

Graded spin-on organic antireflective coating for photolithography

Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

Reducing contamination in immersion lithography

Reducing contamination in immersion lithography

Drying an extreme ultraviolet (EUV) pellicle

Method to increase the lithographic process window of extreme ultra violet negative tone development resists

Polymer brushes for extreme ultraviolet photolithography

Drying an extreme ultraviolet (EUV) pellicle

Mechanical isolation control for an extreme ultraviolet (EUV) pellicle

Method to increase the lithographic process window of extreme ultra violet negative tone development resists

Drying an extreme ultraviolet (EUV) pellicle

Extreme ultraviolet radiation (EUV) pellicle formation apparatus

Apparatus and method for reducing contamination in immersion lithography

Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid

Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition

Photomask and method of making thereof

Resist performance for the negative tone develop organic development process

Evaporation control using coating

GOLDFARB DARIO L

Organic graded spin on BARC compositions for high NA lithography

Molecular spacer layer for semiconductor oxide surface and high-K dielectric stack

Organic graded spin on BARC compositions for high NA lithography

GLODDE MARTIN

Near-infrared absorbing film compositions

Near-infrared absorbing film compositions

SIMONS JOHN P

Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid

Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid

CHENG JOY

Self-segregating multilayer imaging stack with built-in antireflective properties

GLOBALFOUNDRIES INC

Near-infrared absorbing film compositions

HUANG WU-SONG

Near-infrared absorbing film compositions

ARNOLD JOHN C

Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme

OHASHI MASAKI

Near-infrared absorptive layer-forming composition and multilayer film