Inventor

CAI XINYUAN

CN2 patents

Patents

2 patents

US12098299B2Sep 24, 2024

Chemical mechanical polishing slurry and use thereof

ANJI MICROELECTRONICS SHANGHAI CO LTD0 citations55

US11746257B2Sep 5, 2023

Chemical mechanical polishing solution

ANJI MICROELECTRONICS SHANGHAI CO LTD0 citations50