Inventor
FUKUHARA TOSHIAKI
JP38 patents
⚠️ This page may combine multiple inventors who share the name “FUKUHARA TOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
12 patentsUS7504194B2Mar 17, 2009
Positive resist composition and pattern making method using the same
FUJIFILM CORP16 citations92
US8034537B2Oct 11, 2011
Positive resist composition and pattern forming method
FUJIFILM CORP12 citations84
US7790351B2Sep 7, 2010
Positive resist composition and pattern making method using the same
FUJIFILM CORP11 citations84
US7635554B2Dec 22, 2009
Positive resist composition and pattern forming method
FUJIFILM CORP13 citations84
US9523912B2Dec 20, 2016
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound
FUJIFILM CORP7 citations83
US9250519B2Feb 2, 2016
Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method
FUJIFILM CORP8 citations83
US8343708B2Jan 1, 2013
Positive resist composition and pattern forming method
FUJIFILM CORP2 citations63
US7666574B2Feb 23, 2010
Positive resist composition and pattern forming method
FUJIFILM CORP5 citations63
US12346026B2Jul 1, 2025
Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device
FUJIFILM CORP0 citations62
US9405197B2Aug 2, 2016
Pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP2 citations62
US10545405B2Jan 28, 2020
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations41
US9454079B2Sep 27, 2016
Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
FUJIFILM CORP0 citations40
YAZAKI CORP
12 patentsUS7222530B2May 29, 2007
Non-contact type liquid level sensor and non-contact type liquid level detecting method
YAZAKI CORP12 citations84
US10670636B2Jun 2, 2020
Current detection device
YAZAKI CORP2 citations70
US10627428B2Apr 21, 2020
Current detection device
YAZAKI CORP2 citations70
US7331225B2Feb 19, 2008
Non-contact type liquid level sensor
YAZAKI CORP4 citations63
US7225672B2Jun 5, 2007
Liquid level sensor and method of manufacturing the same
YAZAKI CORP2 citations63
US7021139B2Apr 4, 2006
Non-contact type liquid level sensor
YAZAKI CORP6 citations63
US9207110B2Dec 8, 2015
Liquid level detecting device
YAZAKI CORP2 citations61
US10634702B2Apr 28, 2020
Current sensor
YAZAKI CORP1 citations59
US11092622B2Aug 17, 2021
Current detection device
YAZAKI CORP0 citations52
US7490515B2Feb 17, 2009
Liquid level measuring system
YAZAKI CORP1 citations52
US10739385B2Aug 11, 2020
Magnetic permeable member and current detection device
YAZAKI CORP0 citations39
US10446987B2Oct 15, 2019
Connector device
YAZAKI CORP0 citations36
FUKUHARA TOSHIAKI
5 patentsUS8671750B2Mar 18, 2014
Contactless liquid level sensor
FUKUHARA TOSHIAKI10 citations83
US8643496B2Feb 4, 2014
Contact for fluid level detection apparatus and fluid level detection apparatus
FUKUHARA TOSHIAKI2 citations61
US8835098B2Sep 16, 2014
Method of forming pattern
FUKUHARA TOSHIAKI1 citations51
US8438920B2May 14, 2013
Assembly structure of liquid level detecting apparatus and liquid level detecting apparatus
FUKUHARA TOSHIAKI0 citations51
US8932794B2Jan 13, 2015
Positive photosensitive composition and pattern forming method using the same
FUKUHARA TOSHIAKI0 citations40
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
5 patentsUS7169530B2Jan 30, 2007
Polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations73
US7378216B2May 27, 2008
Resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations62
US7166418B2Jan 23, 2007
Sulfonamide compound, polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations62
US7060775B2Jun 13, 2006
Polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations62
US7413843B2Aug 19, 2008
Sulfonamide compound, polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52