Inventor
LEE SHO-SHEN
TW14 patents
⚠️ This page may combine multiple inventors who share the name “LEE SHO-SHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
13 patentsUS10453849B2Oct 22, 2019
Dynamic random access memory structure and method for forming the same
UNITED MICROELECTRONICS CORP6 citations84
US9490217B1Nov 8, 2016
Overlay marks and semiconductor process using the overlay marks
UNITED MICROELECTRONICS CORP12 citations84
US10763264B2Sep 1, 2020
Method for forming dynamic random access memory structure
UNITED MICROELECTRONICS CORP4 citations73
US10079185B1Sep 18, 2018
Semiconductor pattern for monitoring overlay and critical dimension at post-etching stage and metrology method of the same
UNITED MICROELECTRONICS CORP4 citations72
US10177094B1Jan 8, 2019
Measurement mark and method for monitoring semiconductor process
UNITED MICROELECTRONICS CORP4 citations71
US10529667B1Jan 7, 2020
Method of forming overlay mark structure
UNITED MICROELECTRONICS CORP2 citations66
US8954919B1Feb 10, 2015
Calculation method for generating layout pattern in photomask
UNITED MICROELECTRONICS CORP2 citations61
US10276395B2Apr 30, 2019
Method for manufacturing semiconductor device
UNITED MICROELECTRONICS CORP1 citations53
US10692785B2Jun 23, 2020
Semiconductor pattern for monitoring overlay and critical dimension at post-etching stage and metrology method of the same
UNITED MICROELECTRONICS CORP0 citations51
US10373915B1Aug 6, 2019
Method for monitoring semiconductor process
UNITED MICROELECTRONICS CORP0 citations51
US9304389B2Apr 5, 2016
Photomask and fabrication method thereof
UNITED MICROELECTRONICS CORP0 citations50
US10707092B1Jul 7, 2020
Manufacturing method for semiconductor pattern
UNITED MICROELECTRONICS CORP0 citations47
US10707213B2Jul 7, 2020
Method of forming layout of semiconductor device
UNITED MICROELECTRONICS CORP0 citations39