Inventor
MATSUMURA YUUSHI
JP9 patents
Patents
9 patentsUS9958781B2May 1, 2018
Method for film formation, and pattern-forming method
JSR CORP2 citations70
US11003079B2May 11, 2021
Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound
JSR CORP1 citations60
US11667620B2Jun 6, 2023
Composition, film, film-forming method and patterned substrate-producing method
JSR CORP0 citations50
US11320739B2May 3, 2022
Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate
JSR CORP0 citations50
US11126084B2Sep 21, 2021
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound
JSR CORP0 citations50
US11454890B2Sep 27, 2022
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound
JSR CORP0 citations49
US9091922B2Jul 28, 2015
Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method
JSR CORP1 citations46
US11053457B2Jul 6, 2021
Cleaning composition for semiconductor substrate
JSR CORP0 citations44
US9250526B2Feb 2, 2016
Composition for forming resist underlayer film, and pattern-forming method
JSR CORP0 citations37