Inventor
MONAHAN KEVIN M
US32 patents
⚠️ This page may combine multiple inventors who share the name “MONAHAN KEVIN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MULTIBEAM CORP
25 patentsUS10026589B1Jul 17, 2018
Alignment and registration targets for charged particle beam substrate patterning and inspection
MULTIBEAM CORP21 citations94
US9478395B1Oct 25, 2016
Alignment and registration targets for multiple-column charged particle beam lithography and inspection
MULTIBEAM CORP28 citations94
US10020200B1Jul 10, 2018
Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
MULTIBEAM CORP12 citations92
US9673114B1Jun 6, 2017
Precision substrate material removal using miniature-column charged particle beam arrays
MULTIBEAM CORP11 citations92
US9595419B1Mar 14, 2017
Alignment and registration targets for multiple-column charged particle beam lithography and inspection
MULTIBEAM CORP18 citations92
US9556521B1Jan 31, 2017
Precision deposition using miniature-column charged particle beam arrays
MULTIBEAM CORP14 citations92
US9466464B1Oct 11, 2016
Precision substrate material removal using miniature-column charged particle beam arrays
MULTIBEAM CORP12 citations92
US9453281B1Sep 27, 2016
Precision deposition using miniature-column charged particle beam arrays
MULTIBEAM CORP16 citations92
US9207539B1Dec 8, 2015
Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems
MULTIBEAM CORP13 citations92
US8999627B1Apr 7, 2015
Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp
MULTIBEAM CORP15 citations92
US10523433B1Dec 31, 2019
Secure intra-chip hardware micro-segmentation using charged particle beam processing
MULTIBEAM CORP12 citations84
US10341108B1Jul 2, 2019
Secure permanent integrated circuit personalization
MULTIBEAM CORP6 citations84
US10020166B1Jul 10, 2018
Alignment and registration targets for charged particle beam substrate patterning and inspection
MULTIBEAM CORP8 citations84
US9881817B1Jan 30, 2018
Precision substrate material multi-processing using miniature-column charged particle beam arrays
MULTIBEAM CORP11 citations84
US9822443B1Nov 21, 2017
Precision material modification using miniature-column charged particle beam arrays
MULTIBEAM CORP4 citations84
US9824859B1Nov 21, 2017
Precision material modification using miniature-column charged particle beam arrays
MULTIBEAM CORP8 citations84
US9184027B1Nov 10, 2015
Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp
MULTIBEAM CORP10 citations83
US8999628B1Apr 7, 2015
Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems
MULTIBEAM CORP10 citations83
US9620332B1Apr 11, 2017
Charged particle beam substrate inspection using both vector and raster scanning
MULTIBEAM CORP14 citations82
US10659229B1May 19, 2020
Secure permanent integrated circuit personalization
MULTIBEAM CORP1 citations73
US10607845B1Mar 31, 2020
Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
MULTIBEAM CORP2 citations73
US11063756B1Jul 13, 2021
Secure intra-chip hardware micro-segmentation using charged particle beam processing
MULTIBEAM CORP0 citations62
US11037756B1Jun 15, 2021
Precision substrate material multi-processing using miniature-column charged particle beam arrays
MULTIBEAM CORP0 citations62
US10734192B1Aug 4, 2020
Precision substrate material multi-processing using miniature-column charged particle beam arrays
MULTIBEAM CORP0 citations52
US10658153B1May 19, 2020
Precision substrate material multi-processing using miniature-column charged particle beam arrays
MULTIBEAM CORP0 citations52
KLA TENCOR CORP
2 patentsUS5869833AFeb 9, 1999
Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
KLA TENCOR CORP78 citations95
US6211518B1Apr 3, 2001
Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
KLA TENCOR CORP25 citations92