P

Inventor

SUZUKI KAZUAKI

JP106 patents
⚠️ This page may combine multiple inventors who share the name “SUZUKI KAZUAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

23 patents
US5097291AMar 17, 1992

Energy amount control device

NIKON CORP186 citations99
US4970546ANov 13, 1990

Exposure control device

NIKON CORP236 citations97
US6259510B1Jul 10, 2001

Exposure method and apparatus

NIKON CORP53 citations96
US6118515ASep 12, 2000

Scanning exposure method

NIKON CORP83 citations96
US6078381AJun 20, 2000

Exposure method and apparatus

NIKON CORP74 citations96
US5796467AAug 18, 1998

Scanning projection exposure method and apparatus using substrate position adjustment based on mask pattern positioin during scanning exposure

NIKON CORP46 citations96
US5627627AMay 6, 1997

Exposure control apparatus and method

NIKON CORP39 citations96
US4920505AApr 24, 1990

Projection exposure apparatus

NIKON CORP60 citations96
US5191374AMar 2, 1993

Exposure control apparatus

NIKON CORP104 citations95
US5137349AAug 11, 1992

Projection-type optical apparatus

NIKON CORP63 citations95
US6917048B2Jul 12, 2005

Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus

NIKON CORP23 citations93
US6608665B1Aug 19, 2003

Scanning exposure apparatus having adjustable illumination area and methods related thereto

NIKON CORP33 citations93
US6433347B1Aug 13, 2002

Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern

NIKON CORP24 citations93
US6411364B1Jun 25, 2002

Exposure apparatus

NIKON CORP31 citations93
US6384898B1May 7, 2002

Projection exposure apparatus

NIKON CORP20 citations93
US6295119B1Sep 25, 2001

Scanning type exposure apparatus with multiple field diaphragms for providing consistent exposure

NIKON CORP36 citations93
US6268906B1Jul 31, 2001

Exposure apparatus and exposure method

NIKON CORP29 citations93
US6222615B1Apr 24, 2001

Exposure control apparatus and method

NIKON CORP15 citations93
US6104474AAug 15, 2000

Apparatus and method for controlling scanning exposure of photosensitive substrate

NIKON CORP18 citations93
US4982227AJan 1, 1991

Photolithographic exposure apparatus with multiple alignment modes

NIKON CORP24 citations93
US6277533B1Aug 21, 2001

Scanning exposure method

NIKON CORP38 citations92
US4853745AAug 1, 1989

Exposure apparatus

NIKON CORP43 citations92
US6768124B2Jul 27, 2004

Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same

NIKON CORP24 citations88

NIPPON STEEL CORP

4 patents

NIPPON KOGAKU KK

4 patents

SONY CHEMICALS CORP

4 patents

SONY CORP

3 patents

KIMURA YUJI

2 patents

PHILD CO LTD

2 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

2 patents

(unassigned)

1 patent

SUZUKI KAZUAKI

1 patent

ASAHI DENKA KOGYO KK

1 patent

TOSHIBA KK

1 patent

HITACHI LTD

1 patent

HIRATA YOSHIHIRO

1 patent

Showing the top 50 of 106 patents by PatentIndex Score.