Inventor
HIOKI TAKESHI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “HIOKI TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO CHEMICAL CO
20 patentsUS5861229AJan 19, 1999
Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
SUMITOMO CHEMICAL CO7 citations73
US5792585AAug 11, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
SUMITOMO CHEMICAL CO9 citations73
US5188920AFeb 23, 1993
Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound
SUMITOMO CHEMICAL CO10 citations73
US5080997AJan 14, 1992
Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture
SUMITOMO CHEMICAL CO13 citations73
US5077264ADec 31, 1991
Cyan dye-donor element used in thermal transfer and thermal transfer sheet using it
SUMITOMO CHEMICAL CO7 citations73
US5456995AOct 10, 1995
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO14 citations72
US5456996AOct 10, 1995
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO12 citations72
US5407780AApr 18, 1995
Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
SUMITOMO CHEMICAL CO8 citations72
US5198323AMar 30, 1993
Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component
SUMITOMO CHEMICAL CO7 citations72
US5403696AApr 4, 1995
Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol
SUMITOMO CHEMICAL CO7 citations71
US5218136AJun 8, 1993
Styryl compounds, process for preparing the same and photoresist compositions comprising the same
SUMITOMO CHEMICAL CO9 citations70
US5783355AJul 21, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO1 citations62
US5354644AOct 11, 1994
Photoresist compositions comprising styryl compound
SUMITOMO CHEMICAL CO2 citations62
US5220027AJun 15, 1993
Sulfone-containing azamethide compounds with a nitrogen-containing aromatic ring of nitrogen containing aliphatic
SUMITOMO CHEMICAL CO3 citations61
US5136054AAug 4, 1992
Sulfone-containing azamethine compounds
SUMITOMO CHEMICAL CO2 citations61
US5061796AOct 29, 1991
Azamethine compounds
SUMITOMO CHEMICAL CO4 citations61
US5028708AJul 2, 1991
Azamethinyl quinoline derivatives
SUMITOMO CHEMICAL CO3 citations61
US7264912B2Sep 4, 2007
Method of producing photoresist
SUMITOMO CHEMICAL CO4 citations56
US4769494ASep 6, 1988
Process for producing O,O-di-lower-alkylchlorothiophosphate
SUMITOMO CHEMICAL CO0 citations30
NIPPON STEEL CORP
4 patentsUS5259229ANov 9, 1993
Apparatus for cooling thin-webbed H-beam steel
NIPPON STEEL CORP11 citations70
US5191778AMar 9, 1993
Process for producing thin-webbed h-beam steel
NIPPON STEEL CORP11 citations70
US5295380AMar 22, 1994
Edging mill for section rolling
NIPPON STEEL CORP3 citations57
US5896770AApr 27, 1999
Method and apparatus for rolling shape steel
NIPPON STEEL CORP5 citations51