P

Inventor

HIOKI TAKESHI

JP24 patents
⚠️ This page may combine multiple inventors who share the name “HIOKI TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUMITOMO CHEMICAL CO

20 patents
US5861229AJan 19, 1999

Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound

SUMITOMO CHEMICAL CO7 citations73
US5792585AAug 11, 1998

Radiation-sensitive positive resist composition

SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998

Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups

SUMITOMO CHEMICAL CO9 citations73
US5188920AFeb 23, 1993

Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound

SUMITOMO CHEMICAL CO10 citations73
US5080997AJan 14, 1992

Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture

SUMITOMO CHEMICAL CO13 citations73
US5077264ADec 31, 1991

Cyan dye-donor element used in thermal transfer and thermal transfer sheet using it

SUMITOMO CHEMICAL CO7 citations73
US5456995AOct 10, 1995

Radiation-sensitive positive resist composition

SUMITOMO CHEMICAL CO14 citations72
US5456996AOct 10, 1995

Radiation-sensitive positive resist composition

SUMITOMO CHEMICAL CO12 citations72
US5407780AApr 18, 1995

Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

SUMITOMO CHEMICAL CO8 citations72
US5198323AMar 30, 1993

Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component

SUMITOMO CHEMICAL CO7 citations72
US5403696AApr 4, 1995

Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol

SUMITOMO CHEMICAL CO7 citations71
US5218136AJun 8, 1993

Styryl compounds, process for preparing the same and photoresist compositions comprising the same

SUMITOMO CHEMICAL CO9 citations70
US5783355AJul 21, 1998

Radiation-sensitive positive resist composition

SUMITOMO CHEMICAL CO1 citations62
US5354644AOct 11, 1994

Photoresist compositions comprising styryl compound

SUMITOMO CHEMICAL CO2 citations62
US5220027AJun 15, 1993

Sulfone-containing azamethide compounds with a nitrogen-containing aromatic ring of nitrogen containing aliphatic

SUMITOMO CHEMICAL CO3 citations61
US5136054AAug 4, 1992

Sulfone-containing azamethine compounds

SUMITOMO CHEMICAL CO2 citations61
US5061796AOct 29, 1991

Azamethine compounds

SUMITOMO CHEMICAL CO4 citations61
US5028708AJul 2, 1991

Azamethinyl quinoline derivatives

SUMITOMO CHEMICAL CO3 citations61
US7264912B2Sep 4, 2007

Method of producing photoresist

SUMITOMO CHEMICAL CO4 citations56
US4769494ASep 6, 1988

Process for producing O,O-di-lower-alkylchlorothiophosphate

SUMITOMO CHEMICAL CO0 citations30

NIPPON STEEL CORP

4 patents