Inventor
TAKEUCHI YOSHIAKI
JP102 patents
⚠️ This page may combine multiple inventors who share the name “TAKEUCHI YOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
12 patentsUS6906944B2Jun 14, 2005
Ferroelectric memory
TOSHIBA KK73 citations98
US6483737B2Nov 19, 2002
Ferroelectric memory device
TOSHIBA KK119 citations97
US6473330B1Oct 29, 2002
Chain type ferroelectric memory with isolation transistors coupled between a sense amplifier and an equalization circuit
TOSHIBA KK32 citations96
US6643162B2Nov 4, 2003
Ferroelectric memory having a device responsive to current lowering
TOSHIBA KK34 citations93
US6590829B2Jul 8, 2003
Semiconductor integrated circuit
TOSHIBA KK26 citations93
US5627493AMay 6, 1997
Semiconductor device having supply voltage deboosting circuit
TOSHIBA KK31 citations93
US6366490B1Apr 2, 2002
Semiconductor memory device using ferroelectric film
TOSHIBA KK17 citations84
US6671200B2Dec 30, 2003
Ferroelectric random access memory with isolation transistors coupled between a sense amplifier and an equalization circuit
TOSHIBA KK12 citations82
US7295456B2Nov 13, 2007
Chain ferroelectric random access memory (CFRAM) having an intrinsic transistor connected in parallel with a ferroelectric capacitor
TOSHIBA KK4 citations74
US7057917B2Jun 6, 2006
Ferroelectric memory with an intrinsic access transistor coupled to a capacitor
TOSHIBA KK10 citations74
US6901026B2May 31, 2005
Semiconductor integrated circuit equipment with asynchronous operation
TOSHIBA KK10 citations74
US6891775B2May 10, 2005
Asynchronous pseudo SRAM
TOSHIBA KK9 citations74
SUMITOMO CHEMICAL CO
11 patentsUS5804513ASep 8, 1998
Abrasive composition and use of the same
SUMITOMO CHEMICAL CO113 citations97
US6444608B1Sep 3, 2002
Porous titania, catalyst comprising the porous titania
SUMITOMO CHEMICAL CO41 citations96
US5114437AMay 19, 1992
Polishing composition for metallic material
SUMITOMO CHEMICAL CO51 citations96
US5697992ADec 16, 1997
Abrasive particle, method for producing the same, and method of use of the same
SUMITOMO CHEMICAL CO65 citations95
US6440552B1Aug 27, 2002
Boehmite and base coat layer for magnetic recording medium
SUMITOMO CHEMICAL CO38 citations92
US6399540B1Jun 4, 2002
Porous titania, catalyst comprising the porous titania
SUMITOMO CHEMICAL CO32 citations92
US6191067B1Feb 20, 2001
Titania fiber, method for producing the fiber and method for using the fiber
SUMITOMO CHEMICAL CO27 citations92
US6162759ADec 19, 2000
Method for producing a catalyst component-carrying titania fiber
SUMITOMO CHEMICAL CO26 citations92
US6086844AJul 11, 2000
Titania fiber, method for producing the fiber and method for using the fiber
SUMITOMO CHEMICAL CO20 citations92
US5455019AOct 3, 1995
Continuous process for preparing aluminum hydroxide
SUMITOMO CHEMICAL CO21 citations89
US5573582ANov 12, 1996
Process for preparing fine-particulate metal hydroxide comprising aluminum hydroxide and metal oxide comprising aluminum oxide
SUMITOMO CHEMICAL CO25 citations88
MITSUBISHI HEAVY IND LTD
9 patentsUS6456010B2Sep 24, 2002
Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus
MITSUBISHI HEAVY IND LTD101 citations97
US6353201B1Mar 5, 2002
Discharge electrode, RF plasma generation apparatus using the same, and power supply method
MITSUBISHI HEAVY IND LTD88 citations95
US5261962ANov 16, 1993
Plasma-chemical vapor-phase epitaxy system comprising a planar antenna
MITSUBISHI HEAVY IND LTD65 citations94
US7141516B2Nov 28, 2006
High frequency plasma generator and high frequency plasma generating method
MITSUBISHI HEAVY IND LTD20 citations92
US6307146B1Oct 23, 2001
Amorphous silicon solar cell
MITSUBISHI HEAVY IND LTD39 citations89
US7205034B2Apr 17, 2007
Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus
MITSUBISHI HEAVY IND LTD38 citations88
US7833587B2Nov 16, 2010
Method for plasma-enhanced chemical vapor deposition and apparatus for plasma-enhanced chemical vapor deposition
MITSUBISHI HEAVY IND LTD16 citations84
US7319295B2Jan 15, 2008
High-frequency power supply structure and plasma CVD device using the same
MITSUBISHI HEAVY IND LTD15 citations83
US6363881B2Apr 2, 2002
Plasma chemical vapor deposition apparatus
MITSUBISHI HEAVY IND LTD19 citations83
NIPPON TELEGRAPH & TELEPHONE
3 patentsUS5694506ADec 2, 1997
Optical connector
NIPPON TELEGRAPH & TELEPHONE89 citations95
US4869570ASep 26, 1989
Fiber coupler and method and apparatus for manufacturing the same
NIPPON TELEGRAPH & TELEPHONE70 citations94
US5841926ANov 24, 1998
Optical fibers for optical attenuation
NIPPON TELEGRAPH & TELEPHONE39 citations89
CORNING INC
3 patentsUS6535655B1Mar 18, 2003
Fiberoptic polarizer and method of making the same
CORNING INC27 citations92
US6404955B1Jun 11, 2002
System and method for fabricating arrayed optical fiber collimators
CORNING INC20 citations92
US6920255B2Jul 19, 2005
Polarizer-equipped optical fiber ferrule, connector and connector adaptor
CORNING INC12 citations78
TAKEUCHI YOSHIAKI
3 patentsSONY CORP
2 patentsOSAKI ELECTRIC CO LTD
2 patentsHONDA MOTOR CO LTD
2 patentsSHINKO SELLBIC CO LTD
1 patentMITSUBISHI JUKOGYO KAGUSHIKI K
1 patentNAKANISHI YUTAKA
1 patentShowing the top 50 of 102 patents by PatentIndex Score.