P

Inventor

SUZUKI NAOYUKI

JP51 patents
⚠️ This page may combine multiple inventors who share the name “SUZUKI NAOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

18 patents
US11764092B2Sep 19, 2023

Substrate transfer apparatus and substrate processing system

TOKYO ELECTRON LTD6 citations86
US10468237B2Nov 5, 2019

Substrate processing apparatus

TOKYO ELECTRON LTD3 citations73
US10049860B2Aug 14, 2018

Substrate processing apparatus

TOKYO ELECTRON LTD4 citations73
US9673078B2Jun 6, 2017

Cooling processing apparatus and method for operating the same

TOKYO ELECTRON LTD2 citations73
US10392688B2Aug 27, 2019

Film forming apparatus

TOKYO ELECTRON LTD4 citations71
US10381258B2Aug 13, 2019

Apparatus of processing workpiece in depressurized space

TOKYO ELECTRON LTD3 citations70
US12033878B2Jul 9, 2024

Substrate transfer apparatus and substrate processing system

TOKYO ELECTRON LTD0 citations62
US10254693B2Apr 9, 2019

Fixing unit of plate-shaped member, PVD processing apparatus and fixing method of plate-shaped member

TOKYO ELECTRON LTD1 citations60
US11939665B2Mar 26, 2024

Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method

TOKYO ELECTRON LTD1 citations59
US11605547B2Mar 14, 2023

Temperature measuring mechanism, temperature measuring method, and stage device

TOKYO ELECTRON LTD0 citations59
US11417504B2Aug 16, 2022

Stage device and processing apparatus

TOKYO ELECTRON LTD1 citations59
US11282733B2Mar 22, 2022

Stage mechanism, processing apparatus, and method of operating the stage mechanism

TOKYO ELECTRON LTD1 citations56
US12327744B2Jun 10, 2025

Substrate transfer device and substrate processing system

TOKYO ELECTRON LTD0 citations52
US10910215B2Feb 2, 2021

Method of forming later insulating films for MTJ

TOKYO ELECTRON LTD0 citations52
US10068798B2Sep 4, 2018

Method and processing apparatus for performing pre-treatment to form copper wiring in recess formed in substrate

TOKYO ELECTRON LTD1 citations52
US11293092B2Apr 5, 2022

Stage device and processing apparatus

TOKYO ELECTRON LTD0 citations50
US11414747B2Aug 16, 2022

Sputtering device

TOKYO ELECTRON LTD0 citations49
US9787222B2Oct 10, 2017

Electrostatic attraction apparatus, electrostatic chuck and cooling treatment apparatus

TOKYO ELECTRON LTD0 citations40

FANUC LTD

7 patents

SHIONOGI & CO

5 patents

MITSUBISHI RAYON CO

4 patents

SEIKISUI CHEMICAL CO LTD

4 patents

ANELVA CORP

2 patents

MITSUBISHI MOTORS CORP

2 patents

CANON ANELVA CORP

2 patents

FANUC CORP

2 patents

TAKAHASHI CHIKA

1 patent

AKIYAMA TOSHIYUKI

1 patent

KATSURAYAMA MAMORU

1 patent

NITTO CHEMICAL INDUSTRY CO LTD

1 patent

Showing the top 50 of 51 patents by PatentIndex Score.