Inventor

SPENCE CHRISTOPHER A

US37 patents

⚠️ This page may combine multiple inventors who share the name “SPENCE CHRISTOPHER A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SPENCE CHRISTOPHER A

ADVANCED MICRO DEVICES INC

Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types

Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion

Mask quality measurements by fourier space analysis

Method of optical lithography using phase shift masking

Method of optical lithography using phase shift masking

Mask for optical lithography using phase shift masking and integrated circuit produced therefrom

Method of optical lithography using phase shift masking

Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results

Piezo programmable reticle for EUV lithography

System and method for design rule creation and selection

Attenuated phase shift mask

Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin

System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques

Method for evaluation of reticle image using aerial image simulator

Forming local interconnects in integrated circuits

Memory device using a reduced word line voltage during read operations and a method of accessing such a memory device

Method and apparatus for compensating for critical dimension variations in the production of a semiconductor wafer

Method of determining focus and coma of a lens at various locations in an imaging field

Minimizing transistor size in integrated circuits

Method for self-aligning polysilicon gates with field isolation and the resultant structure

Reduce line end pull back by exposing and etching space after mask one trim and etch

Memory cell having increased capacitance via a local interconnect to gate capacitor and a method for making such a cell

Method of and system for improving stability of photomasks

Method and enhancing clear field phase shift masks with border around edges of phase regions

Method of enhancing clear field phase shift masks with chrome border around phase 180 regions

Attenuated phase shift mask comprising phase shifting layer with parabolically shaped sidewalls

Forming minimal size spaces in integrated circuit conductive lines

Lithographic photomask and method of manufacture to improve photomask test measurement

Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions

Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region

System and method for designing an integrated circuit device

Predefined critical spaces in IC patterning to reduce line end pull back

Device and method for determining an illumination intensity profile of an illuminator for a lithography system

Method of extending the areas of clear field phase shift generation

GLOBALFOUNDRIES INC

System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques

Method and apparatus for optimizing an optical proximity correction model

ADVANCED MICRODEVICES INC

Forming minimal size spaces in integrated circuit conductive lines