Inventor

SHENG ZHOU MEI

SG2 patents

Patents

2 patents

US6124927ASep 26, 2000

Method to protect chamber wall from etching by endpoint plasma clean

CHARTERED SEMICONDUCTOR MFG31 citations86

US6660642B2Dec 9, 2003

Toxic residual gas removal by non-reactive ion sputtering

CHARTERED SEMICONDUCTOR MFG7 citations69