P

Inventor

OSAWA AKIHIKO

JP21 patents

Patents

21 patents
US6740931B2May 25, 2004

Semiconductor device

TOSHIBA KK95 citations98
US6239464B1May 29, 2001

Semiconductor gate trench with covered open ends

TOSHIBA KK86 citations98
US5126807AJun 30, 1992

Vertical MOS transistor and its production method

TOSHIBA KK193 citations98
US5578508ANov 26, 1996

Vertical power MOSFET and process of fabricating the same

TOSHIBA KK135 citations97
US5242845ASep 7, 1993

Method of production of vertical MOS transistor

TOSHIBA KK121 citations97
US6501129B2Dec 31, 2002

Semiconductor device

TOSHIBA KK52 citations96
US6060747AMay 9, 2000

Semiconductor device

TOSHIBA KK80 citations96
US6995426B2Feb 7, 2006

Semiconductor device having vertical metal insulator semiconductor transistors having plural spatially overlapping regions of different conductivity type

TOSHIBA KK27 citations92
US6627499B2Sep 30, 2003

Semiconductor device and method of manufacturing the same

TOSHIBA KK24 citations92
US5554872ASep 10, 1996

Semiconductor device and method of increasing device breakdown voltage of semiconductor device

TOSHIBA KK20 citations92
US5250446AOct 5, 1993

Method of manufacturing a semiconductor device by forming at least three regions of different lifetimes of carriers at different depths

TOSHIBA KK48 citations92
US5243205ASep 7, 1993

Semiconductor device with overvoltage protective function

TOSHIBA KK35 citations92
US5126817AJun 30, 1992

Dielectrically isolated structure for use in soi-type semiconductor device

TOSHIBA KK33 citations92
US5084408AJan 28, 1992

Method of making complete dielectric isolation structure in semiconductor integrated circuit

TOSHIBA KK36 citations92
US5731637AMar 24, 1998

Semiconductor device

TOSHIBA KK27 citations91
US6010950AJan 4, 2000

Method of manufacturing semiconductor bonded substrate

TOSHIBA KK10 citations74
US5029324AJul 2, 1991

Semiconductor device having a semiconductive protection layer

TOSHIBA KK10 citations74
US6031276AFeb 29, 2000

Semiconductor device and method of manufacturing the same with stable control of lifetime carriers

TOSHIBA KK7 citations73
US4984052AJan 8, 1991

Bonded substrate of semiconductor elements having a high withstand voltage

TOSHIBA KK15 citations73
US6084263AJul 4, 2000

Power device having high breakdown voltage and method of manufacturing the same

TOSHIBA KK2 citations61
US7227223B2Jun 5, 2007

Power MOS transistor having trench gate

TOSHIBA KK3 citations58