Inventor

SHIN KI SOO

KR32 patents

⚠️ This page may combine multiple inventors who share the name “SHIN KI SOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIN KI SOO

HYNIX SEMICONDUCTOR INC

Cleaning solution for photoresist and method for forming pattern using the same

Overcoating composition for photoresist and method for forming photoresist pattern using the same

Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same

Method of forming photoresist pattern using hot plate oven

Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same

Photoresist monomers, polymers thereof and photoresist compositons containing the same

Photoresist additive for preventing acid migration and photoresist composition comprising the same

Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same

Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same

Photoresist polymer and composition having nitro groups

Cleaning solution for removing photoresist

Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator

Solution composition for removing a remaining photoresist resin

Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator

Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same

Organic anti-reflective coating composition and method for forming photoresist patterns using the same

Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator

Organic anti-reflective coating composition and method for forming photoresist patterns using the same

Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof

Photoresist monomers, polymers thereof and photoresist compositions containing the same

Photoresist monomers, polymers thereof and photoresist compositions containing the same

Cleaning solution for removing photoresist

Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same

Method for forming patterns in a semiconductor device

Method for forming patterns of a semiconductor device

Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same

DONGJIN SEMICHEM CO LTD

Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion

Photoresist polymer and photoresist composition containing the same

CHUN DONG-WAN

Multi mode filter for realizing wide band using capacitive coupling / inductive coupling and capable of tuning coupling value

Wide-band multi-mode filter

HYUNDAI ELECTRONICS IND

EEPROM and method for fabricating the same

DAEGUNTECH CO LTD

3D printer with residual powder removal device