Inventor
ASAKAWA KOJI
JP187 patents
⚠️ This page may combine multiple inventors who share the name “ASAKAWA KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
43 patentsUS7090784B2Aug 15, 2006
Method for manufacturing porous structure and method for forming pattern
TOSHIBA KK94 citations99
US6977108B2Dec 20, 2005
Recording medium including patterned tracks and isolation regions
TOSHIBA KK114 citations99
US6565763B1May 20, 2003
Method for manufacturing porous structure and method for forming pattern
TOSHIBA KK806 citations99
US6303266B1Oct 16, 2001
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK149 citations99
US7476910B2Jan 13, 2009
Semiconductor light emitting device and method for manufacturing the same
TOSHIBA KK53 citations98
US6565764B2May 20, 2003
Method of manufacturing a material having a fine structure
TOSHIBA KK81 citations98
US6465742B1Oct 15, 2002
Three dimensional structure and method of manufacturing the same
TOSHIBA KK111 citations98
US6391471B1May 21, 2002
Functional device and multi-component multi-phase type polymeric shaped material
TOSHIBA KK105 citations98
US7037738B2May 2, 2006
Method of manufacturing a semiconductor light-emitting element
TOSHIBA KK147 citations97
US7517466B2Apr 14, 2009
Method for manufacturing porous structure and method for forming pattern
TOSHIBA KK39 citations96
US7097781B2Aug 29, 2006
Method for manufacturing porous structure and method for forming pattern
TOSHIBA KK50 citations96
US6824957B2Nov 30, 2004
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK42 citations96
US6825056B2Nov 30, 2004
Light-emitting device and method for manufacturing the same
TOSHIBA KK46 citations96
US6280897B1Aug 28, 2001
Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
TOSHIBA KK80 citations96
US5837419ANov 17, 1998
Photosensitive composition
TOSHIBA KK44 citations96
US5694188ADec 2, 1997
Reflection type liquid crystal display device having comb-shaped wall electrode
TOSHIBA KK90 citations96
US5691101ANov 25, 1997
Photosensitive composition
TOSHIBA KK86 citations96
US6440636B1Aug 27, 2002
Polymeric compound and resin composition for photoresist
TOSHIBA KK58 citations95
US8043520B2Oct 25, 2011
Method for manufacturing porous structure and method for forming pattern
TOSHIBA KK23 citations93
US7115208B2Oct 3, 2006
Method of manufacturing recording medium
TOSHIBA KK16 citations93
US6899999B2May 31, 2005
Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member
TOSHIBA KK21 citations93
US6835889B2Dec 28, 2004
Passive element component and substrate with built-in passive element
TOSHIBA KK38 citations93
US6709806B2Mar 23, 2004
Method of forming composite member
TOSHIBA KK38 citations93
US6660450B2Dec 9, 2003
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK18 citations93
US6649516B2Nov 18, 2003
Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regions
TOSHIBA KK21 citations93
US6626724B2Sep 30, 2003
Method of manufacturing electron emitter and associated display
TOSHIBA KK21 citations93
US6563260B1May 13, 2003
Electron emission element having resistance layer of particular particles
TOSHIBA KK41 citations93
US6541597B2Apr 1, 2003
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK20 citations93
US6291129B1Sep 18, 2001
Monomer, high molecular compound and photosensitive composition
TOSHIBA KK22 citations93
US6228552B1May 8, 2001
Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material
TOSHIBA KK39 citations93
US6045968AApr 4, 2000
Photosensitive composition
TOSHIBA KK26 citations93
US7208334B2Apr 24, 2007
Method of manufacturing semiconductor device, acid etching resistance material and copolymer
TOSHIBA KK20 citations92
US7179672B2Feb 20, 2007
Light-emitting device and method for manufacturing the same
TOSHIBA KK23 citations92
US6071670AJun 6, 2000
Transparent resin, photosensitive composition, and method of forming a pattern
TOSHIBA KK37 citations92
US5932391AAug 3, 1999
Resist for alkali development
TOSHIBA KK31 citations92
US5928841AJul 27, 1999
Method of photoetching at 180 to 220
TOSHIBA KK20 citations92
US5863699AJan 26, 1999
Photo-sensitive composition
TOSHIBA KK24 citations92
US9054324B2Jun 9, 2015
Organic molecular memory
TOSHIBA KK5 citations84
US8361339B2Jan 29, 2013
Antireflection structure formation method and antireflection structure
TOSHIBA KK6 citations84
US7928353B2Apr 19, 2011
Displaying device and lighting device employing organic electroluminescence element
TOSHIBA KK12 citations84
US7851564B2Dec 14, 2010
Silicone resin composition
TOSHIBA KK10 citations84
US7786665B2Aug 31, 2010
Organic electroluminescent device having a diffraction grating for enhancing light extraction efficiency
TOSHIBA KK8 citations84
US7759861B2Jul 20, 2010
Organic EL display
TOSHIBA KK13 citations84
FUJI ELECTRIC CO LTD
4 patentsUS5589672ADec 31, 1996
Circuit breaker with arc quenching device and vent
FUJI ELECTRIC CO LTD92 citations96
USD468687SJan 14, 2003
Manual motor starter
FUJI ELECTRIC CO LTD49 citations92
US5569894AOct 29, 1996
Circuit breaker arc quenching device with venting structure including flapper valve
FUJI ELECTRIC CO LTD49 citations92
US5548258AAug 20, 1996
Circuit breaker with insulation device
FUJI ELECTRIC CO LTD22 citations92
ASAKAWA KOJI
1 patentKITAGAWA RYOTA
1 patentMEGACHIPS CORP
1 patentShowing the top 50 of 187 patents by PatentIndex Score.