P

Inventor

CHERIAN ISAAC K

US26 patents
⚠️ This page may combine multiple inventors who share the name “CHERIAN ISAAC K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CABOT MICROELECTRONICS CORP

15 patents
US6776810B1Aug 17, 2004

Anionic abrasive particles treated with positively charged polyelectrolytes for CMP

CABOT MICROELECTRONICS CORP112 citations96
US6527622B1Mar 4, 2003

CMP method for noble metals

CABOT MICROELECTRONICS CORP131 citations96
US6821897B2Nov 23, 2004

Method for copper CMP using polymeric complexing agents

CABOT MICROELECTRONICS CORP60 citations95
US6867140B2Mar 15, 2005

Method of polishing a multi-layer substrate

CABOT MICROELECTRONICS CORP20 citations92
US6855266B1Feb 15, 2005

Polishing system with stopping compound and method of its use

CABOT MICROELECTRONICS CORP26 citations92
US6852632B2Feb 8, 2005

Method of polishing a multi-layer substrate

CABOT MICROELECTRONICS CORP33 citations92
US6841479B2Jan 11, 2005

Method of reducing in-trench smearing during polishing

CABOT MICROELECTRONICS CORP24 citations92
US6705926B2Mar 16, 2004

Boron-containing polishing system and method

CABOT MICROELECTRONICS CORP38 citations92
US6685540B2Feb 3, 2004

Polishing pad comprising particles with a solid core and polymeric shell

CABOT MICROELECTRONICS CORP35 citations92
US7306637B2Dec 11, 2007

Anionic abrasive particles treated with positively charged polyelectrolytes for CMP

CABOT MICROELECTRONICS CORP27 citations91
US6811474B2Nov 2, 2004

Polishing composition containing conducting polymer

CABOT MICROELECTRONICS CORP20 citations91
US6589100B2Jul 8, 2003

Rare earth salt/oxidizer-based CMP method

CABOT MICROELECTRONICS CORP31 citations90
US7004819B2Feb 28, 2006

CMP systems and methods utilizing amine-containing polymers

CABOT MICROELECTRONICS CORP13 citations84
US7311856B2Dec 25, 2007

Polymeric inhibitors for enhanced planarization

CABOT MICROELECTRONICS CORP4 citations63
US7021993B2Apr 4, 2006

Method of polishing a substrate with a polishing system containing conducting polymer

CABOT MICROELECTRONICS CORP5 citations61

CERTAINTEED GYPSUM INC

4 patents

TANIKELLA BRAHMANANDAM V

2 patents

BAKSHI ABHAYA K

2 patents

SAINT GOBAIN CERAMICS

1 patent

CHERIAN ISAAC K

1 patent

SAINT-GOBAIN CERAM & PLASTICS INC

1 patent