Inventor

VON BLANCKENHAGEN GISELA

DE9 patents

⚠️ This page may combine multiple inventors who share the name “VON BLANCKENHAGEN GISELA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

6 patents

US9996005B2Jun 12, 2018

Reflective optical element and optical system for EUV lithography

ZEISS CARL SMT GMBH3 citations72

US10209411B2Feb 19, 2019

Multilayer mirror

ZEISS CARL SMT GMBH4 citations71

US9229331B2Jan 5, 2016

EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method

ZEISS CARL SMT GMBH3 citations71

US9696632B2Jul 4, 2017

Mirror for the EUV wavelength range, method for producing such a mirror, and projection exposure apparatus comprising such a mirror

ZEISS CARL SMT GMBH1 citations51

US9880476B2Jan 30, 2018

Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus

ZEISS CARL SMT GMBH0 citations50

US10061205B2Aug 28, 2018

Reflective optical element

ZEISS CARL SMT GMBH1 citations49

VON BLANCKENHAGEN GISELA

2 patents

US8430514B2Apr 30, 2013

Reflective optical element and method for production of such an optical element

VON BLANCKENHAGEN GISELA1 citations45

US8246182B2Aug 21, 2012

Reflective optical element and method for production of such an optical element

VON BLANCKENHAGEN GISELA1 citations45

MUELLENDER STEPHAN

1 patent

US9494718B2Nov 15, 2016

Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective

MUELLENDER STEPHAN0 citations31