Inventor

CAPODIECI LUIGI

US44 patents

⚠️ This page may combine multiple inventors who share the name “CAPODIECI LUIGI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CAPODIECI LUIGI

ADVANCED MICRO DEVICES INC

Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion

Mask quality measurements by fourier space analysis

Modification of mask layout data to improve writeability of OPC

Optical proximity correction (OPC) technique using generalized figure of merit for photolithograhic processing

Microdevice fabrication method using regular arrays of lines and spaces

Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results

System and method for design rule creation and selection

Method of developing optimized optical proximity correction (OPC) fragmentation script for photolithographic processing

Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures

Utilizing electrical performance data to predict CD variations across stepper field

Methodology for extracting effective lens aberrations using a neural network

Illumination modification scheme synthesis using lens characterization data

Critical dimension equalization across the field by second blanket exposure at low dose over bleachable resist

Design of a new phase shift mask with alternating chrome/phase structures

Fabrication of chrome/phase grating phase shift mask by interferometric lithography

Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin

System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques

Chromeless mask for contact holes

Layout verification based on probability of printing fault

Simplified optical proximity correction based on 1-dimension versus 2-dimension pattern shape classification

Reduce line end pull back by exposing and etching space after mask one trim and etch

Design rules checking augmented with pattern matching

Etch bias distribution across semiconductor wafer

Post-exposure bake simulator for chemically amplified photoresists

Lithographic photomask and method of manufacture to improve photomask test measurement

System and method for designing an integrated circuit device

Predefined critical spaces in IC patterning to reduce line end pull back

Device and method for determining an illumination intensity profile of an illuminator for a lithography system

Microdevice having non-linear structural component and method of fabrication

GLOBALFOUNDRIES INC

Single/double dipole mask for contact holes

Layout pattern correction for integrated circuits

System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques

Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications

WANG LYNN

Automated design layout pattern correction based on context-aware patterns

Stitch insertion for reducing color density differences in double patterning technology (DPT)

WANG LYNN T

Methods for quantitatively evaluating the quality of double patterning technology-compliant layouts

Methods for pattern matching in a double patterning technology-compliant physical design flow

ZOU YI

Methods for decomposing circuit design layouts and for fabricating semiconductor devices using decomposed patterns

System for generating and optimizing mask assist features based on hybrid (model and rules) methodology

ASML MASKTOOLS BV

Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques

(unassigned)

Etch bias distribution across semiconductor wafer

ADVANCED MICRO TECHNOLOGIES IN

Method for manufacturing place &amp; route based on 2-D forbidden patterns

SINGH BHANWAR

Method of lithographic mask correction using localized transmission adjustment

MUDDU SWAMY

Methods for analyzing design rules

Method for manufacturing place & route based on 2-D forbidden patterns