Inventor
EURLINGS MARKUS FRANCISCUS ANT
NL18 patents
⚠️ This page may combine multiple inventors who share the name “EURLINGS MARKUS FRANCISCUS ANT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
14 patentsUS6927004B2Aug 9, 2005
Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
ASML NETHERLANDS BV100 citations97
US6737662B2May 18, 2004
Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
ASML NETHERLANDS BV109 citations96
US7015491B2Mar 21, 2006
Lithographic apparatus, device manufacturing method and device manufactured thereby, control system
ASML NETHERLANDS BV50 citations92
US6741329B2May 25, 2004
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV30 citations92
US7148952B2Dec 12, 2006
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV24 citations89
US6583855B2Jun 24, 2003
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV41 citations89
US7030958B2Apr 18, 2006
Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
ASML NETHERLANDS BV31 citations88
US7026082B2Apr 11, 2006
Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby
ASML NETHERLANDS BV17 citations84
US6710856B2Mar 23, 2004
Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby
ASML NETHERLANDS BV17 citations82
US7316870B2Jan 8, 2008
Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program
ASML NETHERLANDS BV7 citations74
US7113261B2Sep 26, 2006
Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV8 citations73
US7333178B2Feb 19, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations62
US7177010B2Feb 13, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations61
US7224440B2May 29, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations41
ASML MASKTOOLS BV
4 patentsUS7138212B2Nov 21, 2006
Method and apparatus for performing model-based layout conversion for use with dipole illumination
ASML MASKTOOLS BV39 citations95
US6875545B2Apr 5, 2005
Method of removing assist features utilized to improve process latitude
ASML MASKTOOLS BV27 citations92
US7355681B2Apr 8, 2008
Optical proximity correction using chamfers and rounding at corners
ASML MASKTOOLS BV10 citations84
US7349066B2Mar 25, 2008
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
ASML MASKTOOLS BV9 citations83