P

Inventor

NUMANAMI TSUNEO

JP6 patents
⚠️ This page may combine multiple inventors who share the name “NUMANAMI TSUNEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

3 patents
US7344808B2Mar 18, 2008

Method of making photomask blank substrates

SHINETSU CHEMICAL CO10 citations82
US7351504B2Apr 1, 2008

Photomask blank substrate, photomask blank and photomask

SHINETSU CHEMICAL CO8 citations71
US7179567B2Feb 20, 2007

Phase shift mask blank, phase shift mask, and method of manufacture

SHINETSU CHEMICAL CO3 citations58

SHIN ESTU CHEMICAL CO LTD

1 patent
US7329475B2Feb 12, 2008

Method of selecting photomask blank substrates

SHIN ESTU CHEMICAL CO LTD0 citations50

NIKON CORP

1 patent
US7070888B2Jul 4, 2006

Method of selecting photomask blank substrates

NIKON CORP0 citations50

NUMANAMI TSUNEO

1 patent
US8956463B2Feb 17, 2015

Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus

NUMANAMI TSUNEO1 citations41