Inventor

ITOH MASAMITSU

JP70 patents

⚠️ This page may combine multiple inventors who share the name “ITOH MASAMITSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ITOH MASAMITSU

TOSHIBA KK

Plasma processing apparatus and plasma processing method

Method of manufacturing an x-ray exposure mask and device for controlling the internal stress of thin films

Substrate processing apparatus and processing method by use of the apparatus

Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server

Pattern forming method

Developing method, substrate treating method, and substrate treating apparatus

Developing method, substrate treating method, and substrate treating apparatus

Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server

Developing method, substrate treating method, and substrate treating apparatus

Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server

Pattern evaluation method and evaluation apparatus and pattern evaluation program

Method of manufacturing photomask

Charged particle beam irradiation apparatus

Pattern transfer apparatus, an operation management system thereof, and an operation management system for a semiconductor manufacture apparatus

Exposure mask and method and apparatus for manufacturing the same

Exposure mask and method and apparatus for manufacturing the same

Exposure mask and method and apparatus for manufacturing the same

X-ray mask, method of manufacturing the same, and exposure method using the same

Apparatus for processing a substrate

Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server

Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device

Semiconductor device manufacturing method

Exposure mask blank manufacturing method and exposure mask manufacturing method

Developing method, substrate treating method, and substrate treating apparatus

X-ray mask, method for fabricating the same, and pattern formation method

Mask manufacturing method for nanoimprinting

Mask manufacturing device

Photomask manufacturing method and semiconductor device manufacturing method

Photomask manufacturing method and semiconductor device manufacturing method

Photomask manufacturing method and semiconductor device manufacturing method

Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product

Mask defect repairing method and semiconductor device manufacturing method

Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product

Electron beam image picturing method and image picturing device

Pattern formation material, pattern formation method, and exposure mask fabrication method

ITOH MASAMITSU

Mask manufacturing device

Imprint mask manufacturing method for nanoimprinting

Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product

Pattern verification-test method, optical image intensity distribution acquisition method, and computer program

Photomask manufacturing method and semiconductor device manufacturing method

Pattern verification-test method, optical image intensity distribution acquisition method, and computer program

Exposure mask and method for manufacturing same and method for manufacturing semiconductor device

Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product

Photomask evaluation based on lithographic simulation using sidewall angle of photomask pattern

NAT TAX ADMINISTRATION AGENCY

Method of purifying distillers solubles and use of the purified matter

Method of purifying distillers solubles and use of the purified matter

YONEDA IKUO

Template inspection method and manufacturing method for semiconductor device

DAINIPPON PRINTING CO LTD

Mask substrate and its manufacturing method

SHINETSU CHEMICAL CO

Photomask blank substrate, photomask blank and photomask

KANAMITSU SHINGO

Template substrate, method for manufacturing same, and template