Inventor

MAA JER-SHEN

US102 patents

⚠️ This page may combine multiple inventors who share the name “MAA JER-SHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MAA JER-SHEN

SHARP LAB OF AMERICA INC

CMOS active pixel sensor

Real-time CMOS imager having stacked photodiodes fabricated on SOI wafer

Strained silicon fin structure

Strained silicon finFET device

Gallium nitride-on-silicon interface using multiple aluminum compound buffer layers

Self-aligned cross point resistor memory array

Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates

Process integration of Si1-xGex CMOS with Si1-xGex relaxation after STI formation

Molecular hydrogen implantation method for forming a relaxed silicon germanium layer with high germanium content

Single c-axis PGO thin film on ZrO2 for non-volatile memory applications and methods of making the same

Ferroelectric nonvolatile transistor and method of making same

System and method for isolating silicon germanium dislocation regions in strained-silicon CMOS applications

Methods of making relaxed silicon-germanium on insulator via layer transfer

Strained silicon on insulator from film transfer and relaxation by hydrogen implantation

Ge imager for short wavelength infrared

Ge short wavelength infrared imager

Germanium photo detector having planar surface through germanium epitaxial overgrowth

High-density germanium-on-insulator photodiode array

Method of making relaxed silicon-germanium on insulator via layer transfer with stress reduction

Method of fabricating a low-defect strained epitaxial germanium film on silicon

Method to form local “silicon-on-nothing” or “silicon-on-insulator” wafers with tensile-strained silicon

Epitaxial growth of germanium photodetector for CMOS imagers

Method of forming relaxed SiGe layer

Method for amorphization re-crystallization of Si1-xGex films on silicon substrates

Device including an epitaxial nickel silicide on (100) Si or stable nickel silicide on amorphous Si and a method of fabricating the same

Nickel silicide including iridium for use in ultra-shallow junctions with high thermal stability and method of manufacturing the same

MOCVD metal oxide for one transistor memory

Composite iridium-metal-oxygen barrier structure with refractory metal companion barrier

Composite iridium-metal-oxygen barrier structure with refractory metal companion barrier and method for same

Silicon/germanium superlattice thermal sensor

Strained silicon on insulator from film transfer and relaxation by hydrogen implantation

Method to form relaxed sige layer with high ge content

MOS transistor having shallow source/drain junctions and low leakage current

Partial silicidation method to form shallow source/drain junctions

Method for transferring a multi-level photoresist pattern

Rapid thermal annealing with absorptive layers for thin film transistors on transparent substrates

Method of making relaxed silicon-germanium on glass via layer transfer

Method of fabricating silicon on glass via layer transfer

Fabrication of a low defect germanium film by direct wafer bonding

Fabrication of thin film germanium infrared sensor by bonding to silicon wafer

Integration of biaxial tensile strained NMOS and uniaxial compressive strained PMOS on the same wafer

Three-dimensional quantum dot structure for infrared photodetection

Method for recrystallizing an amorphized silicon germanium film overlying silicon

Method to form thermally stable nickel germanosilicide on SiGe

Ferroelectric nonvolatile transistor

Method for anisotropic plasma etching using non-chlorofluorocarbon, fluorine-based chemistry

SHARP MICROELECT TECH INC

Method for a chemical vapor deposition of copper on an ion prepared conductive surface

Method of forming transistor electrodes from directionally deposited silicide

Raised silicided source/drain electrode formation with reduced substrate silicon consumption

RCA CORP

Etching of tantalum silicide/doped polysilicon structures