Inventor
WANG WEI W
US24 patents
⚠️ This page may combine multiple inventors who share the name “WANG WEI W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
19 patentsUS7520957B2Apr 21, 2009
Lid assembly for front end of line fabrication
APPLIED MATERIALS INC162 citations98
US7396480B2Jul 8, 2008
Method for front end of line fabrication
APPLIED MATERIALS INC285 citations98
US7942969B2May 17, 2011
Substrate cleaning chamber and components
APPLIED MATERIALS INC492 citations97
US7604708B2Oct 20, 2009
Cleaning of native oxide with hydrogen-containing radicals
APPLIED MATERIALS INC226 citations97
US7480129B2Jan 20, 2009
Detachable electrostatic chuck for supporting a substrate in a process chamber
APPLIED MATERIALS INC87 citations97
US7244344B2Jul 17, 2007
Physical vapor deposition plasma reactor with VHF source power applied through the workpiece
APPLIED MATERIALS INC34 citations96
US7907384B2Mar 15, 2011
Detachable electrostatic chuck for supporting a substrate in a process chamber
APPLIED MATERIALS INC13 citations92
US7697260B2Apr 13, 2010
Detachable electrostatic chuck
APPLIED MATERIALS INC35 citations92
US9853579B2Dec 26, 2017
Rotatable heated electrostatic chuck
APPLIED MATERIALS INC9 citations84
US7658802B2Feb 9, 2010
Apparatus and a method for cleaning a dielectric film
APPLIED MATERIALS INC8 citations84
US7804040B2Sep 28, 2010
Physical vapor deposition plasma reactor with arcing suppression
APPLIED MATERIALS INC10 citations79
US10325763B2Jun 18, 2019
Physical vapor deposition processing systems target cooling
APPLIED MATERIALS INC2 citations73
US10249522B2Apr 2, 2019
In-situ temperature measurement in a noisy environment
APPLIED MATERIALS INC3 citations73
US9831074B2Nov 28, 2017
Bipolar collimator utilized in a physical vapor deposition chamber
APPLIED MATERIALS INC3 citations73
US9673074B2Jun 6, 2017
In-situ temperature measurement in a noisy environment
APPLIED MATERIALS INC2 citations73
US11011357B2May 18, 2021
Methods and apparatus for multi-cathode substrate processing
APPLIED MATERIALS INC1 citations62
US11101117B2Aug 24, 2021
Methods and apparatus for co-sputtering multiple targets
APPLIED MATERIALS INC0 citations59
US11211230B2Dec 28, 2021
Gas flow system
APPLIED MATERIALS INC0 citations56
US10468238B2Nov 5, 2019
Methods and apparatus for co-sputtering multiple targets
APPLIED MATERIALS INC0 citations49