Inventor
ZELLNER JOHANNES
DE14 patents
⚠️ This page may combine multiple inventors who share the name “ZELLNER JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
6 patentsUS8027022B2Sep 27, 2011
Projection objective
ZEISS CARL SMT GMBH12 citations84
US9304408B2Apr 5, 2016
Projection objective for microlithography
ZEISS CARL SMT GMBH0 citations51
US9195145B2Nov 24, 2015
Microlithographic imaging optical system including multiple mirrors
ZEISS CARL SMT GMBH0 citations51
US7999917B2Aug 16, 2011
Illumination system and microlithographic projection exposure apparatus including same
ZEISS CARL SMT GMBH0 citations51
US9372411B2Jun 21, 2016
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations48
US10578972B2Mar 3, 2020
EUV collector for use in an EUV projection exposure apparatus
ZEISS CARL SMT GMBH0 citations39
ZEISS CARL SMT AG
4 patentsUS7477355B2Jan 13, 2009
Projection exposure apparatus and projection optical system
ZEISS CARL SMT AG10 citations83
US7557902B2Jul 7, 2009
Projection objective
ZEISS CARL SMT AG10 citations81
US7697211B2Apr 13, 2010
Symmetrical objective having four lens groups for microlithography
ZEISS CARL SMT AG2 citations62
US7524072B2Apr 28, 2009
Optical component, comprising a material with a predetermined homogeneity of thermal expansion
ZEISS CARL SMT AG4 citations61
MANN HANS-JUERGEN
3 patentsUS8873122B2Oct 28, 2014
Microlithographic imaging optical system including multiple mirrors
MANN HANS-JUERGEN4 citations72
US9182578B2Nov 10, 2015
Imaging optical system and illumination optical system
MANN HANS-JUERGEN0 citations51
US9057964B2Jun 16, 2015
Imaging optics and projection exposure installation for microlithography with an imaging optics
MANN HANS-JUERGEN1 citations49