Inventor

MELVIN III LAWRENCE S

US46 patents

⚠️ This page may combine multiple inventors who share the name “MELVIN III LAWRENCE S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MELVIN III LAWRENCE S

SYNOPSYS INC

Method and apparatus for placing assist features by identifying locations of constructive and destructive interference

Assist feature placement using a process-sensitivity model

Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity model

Method and apparatus to determine if a pattern is robustly manufacturable

Modeling mask corner rounding effects using multiple mask layers

Method and apparatus for assessing the quality of a process model

Method and apparatus for generating an OPC segmentation based on modeled intensity gradients

Method and apparatus for determining an improved assist feature configuration in a mask layout

Method and apparatus for identifying assist feature placement problems

Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model

Method and apparatus for modeling long-range EUVL flare

Method and apparatus for expediting convergence in model-based OPC

Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout

Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layout

Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model

Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profile

Method and apparatus for determining an accurate photolithography process model

Inclusion of stochastic behavior in source mask optimization

Resolution enhancement techniques based on holographic imaging technology

Using mask fabrication models in correction of lithographic masks

Stochastic signal prediction in compact modeling

Design-prioritized mask correction

Model-based two-dimensional interpretation filtering

Optical source compensation

Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profile

Method and system for correlating physical model representation to pattern layout

Facilitating process model accuracy by modeling mask corner rounding effects

Method and apparatus for improving depth of focus during optical lithography

Compensating for effects of topography variation by using a variable intensity-threshold

Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model

Compact OPC model generation using virtual data

Undercut EUV absorber reflective contrast enhancement

Lithography improvement based on defect probability distributions and critical dimension variations

Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout

Prioritized mask correction

Method and apparatus for modifying a layout to improve manufacturing robustness

Reflective EUV mask absorber manipulation to improve wafer contrast

Compact modeling for the negative tone development processes

Method and apparatus for determining a process model using a 2-D-pattern detecting kernel

Method and apparatus for correcting 3D mask effects

Method and apparatus for determining whether a sub-resolution assist feature will print

Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography

HUANG JENSHENG

Method and apparatus for determining a photolithography process model which models the influence of topography variations

CHEN CHARLIE CHUNG-PING

Compact abbe&#39;s kernel generation using principal component analysis

ISOYAN ARTAK

Fast photolithography process simulation to predict remaining resist thickness

LI JIANLIANG

Method and apparatus for determining an optical threshold and a resist bias

Compact abbe's kernel generation using principal component analysis