Inventor
HARADA KAZUHIRO
JP52 patents
⚠️ This page may combine multiple inventors who share the name “HARADA KAZUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
15 patentsUS11434564B2Sep 6, 2022
Method of manufacturing semiconductor device, substrate processing apparatus, recording medium and method of processing substrate
KOKUSAI ELECTRIC CORP2 citations72
US12467689B2Nov 11, 2025
Furnace opening structure, substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11885016B2Jan 30, 2024
Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US10388530B2Aug 20, 2019
Method of manufacturing semiconductor device and substrate processing apparatus
KOKUSAI ELECTRIC CORP1 citations62
US12550640B2Feb 10, 2026
Method of processing substrate, substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US12195848B2Jan 14, 2025
Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US11618947B2Apr 4, 2023
Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US12406843B2Sep 2, 2025
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations60
US11823886B2Nov 21, 2023
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations60
US11728159B2Aug 15, 2023
Method of manufacturing semiconductor device, surface treatment method, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations59
US11257669B2Feb 22, 2022
Method of manufacturing semiconductor device, surface treatment method, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations59
US12351908B2Jul 8, 2025
Substrate processing method, recording medium, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations52
US12217959B2Feb 4, 2025
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations52
US11004676B2May 11, 2021
Method for manufacturing semiconductor device, non-transitory computer-readable recording medium, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations51
US11515152B2Nov 29, 2022
Method of manufacturing semiconductor device, substrate processing apparatus, and method of processing substrate
KOKUSAI ELECTRIC CORP0 citations49
HITACHI INT ELECTRIC INC
12 patentsUS9187826B2Nov 17, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC6 citations84
US9728409B2Aug 8, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC4 citations73
US9558937B2Jan 31, 2017
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC4 citations73
US9425039B2Aug 23, 2016
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations63
US10361084B2Jul 23, 2019
Method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and supply system
HITACHI INT ELECTRIC INC0 citations52
US9190281B2Nov 17, 2015
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US9059089B2Jun 16, 2015
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US7709276B2May 4, 2010
Manufacturing method of a semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations52
US10355098B2Jul 16, 2019
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations51
US9368358B2Jun 14, 2016
Method of manufacturing a semiconductor device
HITACHI INT ELECTRIC INC0 citations51
US10720324B2Jul 21, 2020
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC0 citations42
US9418855B2Aug 16, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC0 citations42
HARADA KAZUHIRO
7 patentsUS8110491B2Feb 7, 2012
Method of manufacturing semiconductor device and substrate processing apparatus
HARADA KAZUHIRO10 citations83
US8529695B2Sep 10, 2013
Method for manufacturing a silicon wafer
HARADA KAZUHIRO6 citations72
US8728935B2May 20, 2014
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
HARADA KAZUHIRO2 citations62
US8492258B2Jul 23, 2013
Method of manufacturing semiconductor device and substrate processing apparatus
HARADA KAZUHIRO2 citations62
US9218993B2Dec 22, 2015
Method of manufacturing semiconductor device and method of processing substrate
HARADA KAZUHIRO1 citations51
US8562739B2Oct 22, 2013
Silica glass crucible for pulling up silicon single crystal and method for manufacturing thereof
HARADA KAZUHIRO0 citations51
US8951346B2Feb 10, 2015
Silica glass crucible for pulling up silicon single crystal and method for manufacturing thereof
HARADA KAZUHIRO0 citations41
MURATA MANUFACTURING CO
4 patentsUS6008981ADec 28, 1999
Monolithic ceramic capacitor
MURATA MANUFACTURING CO23 citations93
US5877934AMar 2, 1999
Ceramic composition and multilayer ceramic capacitor made therefrom
MURATA MANUFACTURING CO40 citations93
US6380118B1Apr 30, 2002
Nonlinear dielectric ceramic, pulse generating capacitor, high-pressure vapor discharge lamp circuit, and high-pressure vapor discharge lamp
MURATA MANUFACTURING CO13 citations74
US6356037B1Mar 12, 2002
Dielectric ceramic and a capacitor using the same
MURATA MANUFACTURING CO11 citations72
SUMITOMO MITSUBISHI SILICON
3 patentsUS7074271B2Jul 11, 2006
Method of identifying defect distribution in silicon single crystal ingot
SUMITOMO MITSUBISHI SILICON7 citations63
US7294203B2Nov 13, 2007
Heat shielding member of silicon single crystal pulling system
SUMITOMO MITSUBISHI SILICON1 citations48
US7208042B2Apr 24, 2007
Method of manufacturing silicon single crystal and silicon single crystal manufactured by the method
SUMITOMO MITSUBISHI SILICON0 citations47
NIPPON TELEGRAPH & TELEPHONE
1 patentFUJITSU LTD
1 patentMITSUBISHI MATERIAL SILICON
1 patentMATSUSHITA ELECTRIC INDUSTRIAL CO LTD
1 patentHORII SADAYOSHI
1 patentOMRON TATEISI ELECTRONICS CO
1 patentSUMCO CORP
1 patentUNIV NAGOYA NAT UNIV CORP
1 patentSQUARE ENIX CO LTD
1 patentShowing the top 50 of 52 patents by PatentIndex Score.